Characterization of the low-pressure chemical vapor deposition grown rugged polysilicon surface using atomic force microscopy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 1007-1013

  Strausser, Yale E ^a   Schroth, Michael ^b   Sweeney III, John J ^b  

^a Digital Instruments   (United States)

^b Bruce Technologies International   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001471205     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580507     Document Type: Article

References (13)

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