Microstructure and tribological properties of the a-C:H films deposited by magnetron sputtering with CH4/Ar mixture

Surface and Coatings Technology

Volumn 205, Issue 19, 2011, Pages 4577-4581

  Wang, Yongxia ^a,b   Ye, Yinping ^a   Li, Hongxuan ^a   Ji, Li ^a   Wang, Yongjun ^a,b   Liu, Xiaohong ^a   Chen, Jianmin ^a   Zhou, Huidi ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

A C:H film; Magnetron sputtering; Microstructure; Tribological property

Indexed keywords

A-C:H FILMS; DEPOSITION PROCESS; FTIR; H-CONTENT; HYDROGENATED AMORPHOUS CARBON (A-C:H); INTERNAL STRESS; MICROSTRUCTURE AND PROPERTIES; REACTANT GAS; SUBSTRATE CURVATURE; TRIBOLOGICAL PROPERTIES; UNBALANCED MAGNETRON SPUTTERING;

AMORPHOUS CARBON; AMORPHOUS SILICON; ARGON; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CARBON FILMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; MICROSTRUCTURE; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; TRIBOLOGY;

AMORPHOUS FILMS;

EID: 79955910865     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.03.120     Document Type: Article

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