-
1
-
-
56849087931
-
-
10.1557/mrs2008.221
-
D. G. Schlom, S. Guha, and S. Datta, MRS Bull., 33, 1017 (2008). 10.1557/mrs2008.221
-
(2008)
MRS Bull.
, vol.33
, pp. 1017
-
-
Schlom, D.G.1
Guha, S.2
Datta, S.3
-
2
-
-
0035872897
-
-
10.1063/1.1361065
-
G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys., 89, 5243 (2001). 10.1063/1.1361065
-
(2001)
J. Appl. Phys.
, vol.89
, pp. 5243
-
-
Wilk, G.D.1
Wallace, R.M.2
Anthony, J.M.3
-
4
-
-
0003689862
-
-
Vol., 1st ed., American Society for Metals, Ohio.
-
T. B. Massalaski, Binary Alloy Phase Diagrams, Vol. 2, 1st ed., American Society for Metals, Ohio (1986).
-
(1986)
Binary Alloy Phase Diagrams
, vol.2
-
-
Massalaski, T.B.1
-
5
-
-
56049098674
-
-
10.1103/PhysRevB.78.012102
-
C.-K. Lee, E. Cho, H.-S. Lee, C. S. Hwang, and S. Han, Phys. Rev. B, 78, 012102 (2008). 10.1103/PhysRevB.78.012102
-
(2008)
Phys. Rev. B
, vol.78
, pp. 012102
-
-
Lee, C.-K.1
Cho, E.2
Lee, H.-S.3
Hwang, C.S.4
Han, S.5
-
7
-
-
58149508161
-
-
10.1063/1.3063126
-
G. Dutta, Appl. Phys. Lett., 94, 012907 (2009). 10.1063/1.3063126
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 012907
-
-
Dutta, G.1
-
8
-
-
33749476389
-
2
-
DOI 10.1063/1.2355471
-
K. Tomida, K. Kita, and A. Toriumi, Appl. Phys. Lett., 89, 142902 (2006). 10.1063/1.2355471 (Pubitemid 44522240)
-
(2006)
Applied Physics Letters
, vol.89
, Issue.14
, pp. 142902
-
-
Tomida, K.1
Kita, K.2
Toriumi, A.3
-
9
-
-
33750906812
-
Enhancement of dielectric constant in Hf O2 thin films by the addition of Al2 O3
-
DOI 10.1063/1.2387126
-
P.K. Park and S.-W. Kang, Appl. Phys. Lett., 89, 192905 (2006). 10.1063/1.2387126 (Pubitemid 44729712)
-
(2006)
Applied Physics Letters
, vol.89
, Issue.19
, pp. 192905
-
-
Park, P.K.1
Kang, S.-W.2
-
10
-
-
56049118914
-
-
10.1149/1.3020763
-
J. Niinist, K. Kukli, T. Sajavaara, M. Ritala, M. Leskel, L. Oberbeck, J. Sundqvist, and U. Schrder, Electrochem. Solid-State Lett., 12, G1 (2009). 10.1149/1.3020763
-
(2009)
Electrochem. Solid-State Lett.
, vol.12
, pp. 1
-
-
Niinist, J.1
Kukli, K.2
Sajavaara, T.3
Ritala, M.4
Leskel, M.5
Oberbeck, L.6
Sundqvist, J.7
Schrder, U.8
-
11
-
-
35549001468
-
Dielectric properties of dysprosium- and scandium-doped hafnium dioxide thin films
-
DOI 10.1063/1.2798498
-
C. Adelmann, V. Sriramkumar, S. Van Elshocht, P. Lehnen, T. Conard, and S. De Gendt, Appl. Phys. Lett., 91, 162902 (2007). 10.1063/1.2798498 (Pubitemid 350010700)
-
(2007)
Applied Physics Letters
, vol.91
, Issue.16
, pp. 162902
-
-
Adelmann, C.1
Sriramkumar, V.2
Van Elshocht, S.3
Lehnen, P.4
Conard, T.5
De Gendt, S.6
-
12
-
-
34547842574
-
Higher permittivity rare earth doped Hf O2 for sub- 45-nm metal-insulator-semiconductor devices
-
DOI 10.1063/1.2768002
-
S. Govindarajan, T. S. Bscke, P. Sivasurbramani, P. D. Kirsch, B. H. Lee, H.-H. Tseng, R. Jammy, U. Schrder, S. Ramanathan, and B. E. Gnade, Appl. Phys. Lett., 91, 062906 (2007). 10.1063/1.2768002 (Pubitemid 47247158)
-
(2007)
Applied Physics Letters
, vol.91
, Issue.6
, pp. 062906
-
-
Govindarajan, S.1
Boscke, T.S.2
Sivasubramani, P.3
Kirsch, P.D.4
Lee, B.H.5
Tseng, H.-H.6
Jammy, R.7
Schroder, U.8
Ramanathan, S.9
Gnade, B.E.10
-
13
-
-
0028368082
-
-
10.1111/j.1151-2916.1994.tb06964.x
-
P. Li, I.-W. Chen, and J. E. Penner-Hahn, J. Am. Ceram. Soc., 77, 118 (1994). 10.1111/j.1151-2916.1994.tb06964.x
-
(1994)
J. Am. Ceram. Soc.
, vol.77
, pp. 118
-
-
Li, P.1
Chen, I.-W.2
Penner-Hahn, J.E.3
-
14
-
-
58149242281
-
-
10.1063/1.3041628
-
J. Robertson, J. Appl. Phys., 104, 124111 (2008). 10.1063/1.3041628
-
(2008)
J. Appl. Phys.
, vol.104
, pp. 124111
-
-
Robertson, J.1
-
15
-
-
33846988575
-
-
10.1149/1.2435509
-
S. Van Elshocht, A. Hardy, T. Witters, C. Adelmann, M. Caymax, T. Conard, S. De Gendt, A. Franquet, O. Richard, M. K. Van Bael, Electrochem. Solid-State Lett., 10, G15 (2007). 10.1149/1.2435509
-
(2007)
Electrochem. Solid-State Lett.
, vol.10
, pp. 15
-
-
Van Elshocht, S.1
Hardy, A.2
Witters, T.3
Adelmann, C.4
Caymax, M.5
Conard, T.6
De Gendt, S.7
Franquet, A.8
Richard, O.9
Van Bael, M.K.10
-
16
-
-
20844433675
-
Structural, electronic, and dielectric properties of ultrathin zirconia films on silicon
-
DOI 10.1063/1.1864235, 152902
-
S. Sayan, N. V. Nguyen, J. Ehrstein, T. Emge, E. Garfunkel, M. Croft, X. Zhao, D. Vanderbilt, I. Levin, E. P. Gusev, Appl. Phys. Lett., 86, 152902 (2005). 10.1063/1.1864235 (Pubitemid 40861437)
-
(2005)
Applied Physics Letters
, vol.86
, Issue.15
, pp. 1-3
-
-
Sayan, S.1
Nguyen, N.V.2
Ehrstein, J.3
Emge, T.4
Garfunkel, E.5
Croft, M.6
Zhao, X.7
Vanderbilt, D.8
Levin, I.9
Gusev, E.P.10
Kim, H.11
McIntyre, P.J.12
-
18
-
-
76349091392
-
-
10.1149/1.3367749
-
M. S. Lee, C.-H. An, J. H. Lim, J. Joo, H.-J. Lee, and H. Kim, J. Electrochem. Soc., 157, G142 (2010). 10.1149/1.3367749
-
(2010)
J. Electrochem. Soc.
, vol.157
, pp. 142
-
-
Lee, M.S.1
An, C.-H.2
Lim, J.H.3
Joo, J.4
Lee, H.-J.5
Kim, H.6
-
19
-
-
0028442218
-
-
10.1111/j.1151-2916.1994.tb05403.x
-
P. Li, I-W. Chen, and J. E. Penner-Hahn, J. Am. Ceramc. Soc., 77, 1281 (1994). 10.1111/j.1151-2916.1994.tb05403.x
-
(1994)
J. Am. Ceramc. Soc.
, vol.77
, pp. 1281
-
-
Li, P.1
Chen, I.-W.2
Penner-Hahn, J.E.3
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