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Volumn 63, Issue 21, 2009, Pages 1817-1819
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Novel approach to thin film polycrystalline silicon on glass
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Author keywords
Expanding thermal plasma; Polycrystalline silicon; Solar energy materials; Solid Phase Crystallization; Thin films
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Indexed keywords
A-SI:H;
CRYSTAL GRAINS;
EXPANDING THERMAL PLASMA;
EXPANDING THERMAL PLASMAS;
HIGH DEPOSITION RATES;
HIGH SUBSTRATE TEMPERATURE;
POLY-SI;
POLYCRYSTALLINE SILICON;
POLYCRYSTALLINE SILICON (POLY-SI);
SOLAR ENERGY MATERIALS;
SOLID PHASE CRYSTALLIZATION;
THIN FILM POLYCRYSTALLINE SILICON;
THIN FILM SOLAR CELLS;
CRYSTALLIZATION;
GLASS;
PLASMA DEPOSITION;
PLASMAS;
POLYCRYSTALLINE MATERIALS;
POLYSILICON;
SOLAR ENERGY;
SOLAR RADIATION;
THIN FILM DEVICES;
THIN FILMS;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 67649338404
PISSN: 0167577X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.matlet.2009.05.044 Document Type: Article |
Times cited : (25)
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References (24)
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