SCOPUS 정보 검색 플랫폼

Volumn 50, Issue 4 PART 2, 2011, Pages

Fabrication of Ge metal-oxide-semiconductor capacitors with high-quality interface by ultrathin SiO2/GeO2 bilayer passivation and postmetallization annealing effect of al

(7) Hirayama, Kana a Ueno, Ryuji a Iwamura, Yoshiaki a Yoshino, Keisuke a Wang, Dong a Yang, Haigui a Nakashima, Hiroshi a

a KYUSHU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BI-LAYER; ELECTRICAL PASSIVATION; GE SURFACES; HIGH-QUALITY INTERFACE; INSULATING FILM; INTERFACE STATE DENSITY; METAL OXIDE SEMICONDUCTOR STRUCTURES; METAL-OXIDE-SEMICONDUCTOR CAPACITORS; NOVEL METHODS; POST-METALLIZATION ANNEALING; SURFACE PREPARATION; THERMAL ETCHING; ULTRA-THIN; VACUUM-ANNEALING;

ALUMINUM; ANNEALING; CAPACITORS; GERMANIUM; METAL ANALYSIS; MOS CAPACITORS; SILICON COMPOUNDS;

PASSIVATION;

EID: 79955412267 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.50.04DA10 Document Type: Article

Times cited : (26)

References (14)

1
- 41749107944
- D. Kuzum, T. Krishnamohan, A. J. Pethe, A. K. Okyay, Y. Oshima, Y. Sun, J. P. McVittie, P. A. Pianetta, P. C. McIntyre, and K. C. Saraswat: IEEE Electron Device Lett. 29 (2008) 328.
- (2008) IEEE Electron Device Lett. , vol.29 , pp. 328
- Kuzum, D.¹ Krishnamohan, T.² Pethe, A.J.³ Okyay, A.K.⁴ Oshima, Y.⁵ Sun, Y.⁶ McVittie, J.P.⁷ Pianetta, P.A.⁸ McIntyre, P.C.⁹ Saraswat, K.C.¹⁰

2
- 33847119423
- T. Maeda, M. Nishizawa, Y. Morita, and S. Takagi: Appl. Phys. Lett. 90 (2007) 072911.
- (2007) Appl. Phys. Lett. , vol.90 , pp. 072911
- Maeda, T.¹ Nishizawa, M.² Morita, Y.³ Takagi, S.⁴

3
- 33947317756
- T. Sugawara, Y. Oshima, R. Sreenivasan, and P. C. McIntyre: Appl. Phys. Lett. 90 (2007) 112912.
- (2007) Appl. Phys. Lett. , vol.90 , pp. 112912
- Sugawara, T.¹ Oshima, Y.² Sreenivasan, R.³ McIntyre, P.C.⁴

4
- 48249136210
- H. Matsubara, T. Sasada, M. Takenaka, and S. Takagi: Appl. Phys. Lett. 93 (2008) 032104.
- (2008) Appl. Phys. Lett. , vol.93 , pp. 032104
- Matsubara, H.¹ Sasada, T.² Takenaka, M.³ Takagi, S.⁴

5
- 54949120181
- M. Houssa, G. Pourtois, M. Caymax, M. Meuris, M. M. Heyns, V. V. Afanas'ev, and A. Stesmans: Appl. Phys. Lett. 93 (2008) 161909.
- (2008) Appl. Phys. Lett. , vol.93 , pp. 161909
- Houssa, M.¹ Pourtois, G.² Caymax, M.³ Meuris, M.⁴ Heyns, M.M.⁵ Afanas'ev, V.V.⁶ Stesmans, A.⁷

6
- 0034226431
- K. Prabhakaran, F. Maeda, Y. Watanabe, and T. Ogino: Thin Solid Films 369 (2000) 289.
- (2000) Thin Solid Films , vol.369 , pp. 289
- Prabhakaran, K.¹ Maeda, F.² Watanabe, Y.³ Ogino, T.⁴

7
- 48249137791
- K. Kita, S. Suzuki, H. Nomura, T. Takahashi, T. Nishimura, and A. Toriumi: Jpn. J. Appl. Phys. 47 (2008) 2349.
- (2008) Jpn. J. Appl. Phys. , vol.47 , pp. 2349
- Kita, K.¹ Suzuki, S.² Nomura, H.³ Takahashi, T.⁴ Nishimura, T.⁵ Toriumi, A.⁶

8
- 65949085352
- T. Hosoi, K. Kutsuki, G. Okamoto, M. Saito, T. Shimura, and H. Watanabe: Appl. Phys. Lett. 94 (2009) 202112.
- (2009) Appl. Phys. Lett. , vol.94 , pp. 202112
- Hosoi, T.¹ Kutsuki, K.² Okamoto, G.³ Saito, M.⁴ Shimura, T.⁵ Watanabe, H.⁶

9
- 0029273669
- K. Prabhakaran and T. Ogino: Surf. Sci. 325 (1995) 263.
- (1995) Surf. Sci. , vol.325 , pp. 263
- Prabhakaran, K.¹ Ogino, T.²

10
- 3142776507
- H. Nakashima, D. Wang, T. Noguchi, K. Itani, J. Wang, and L. Zhao: Jpn. J. Appl. Phys. 43 (2004) 2402.
- (2004) Jpn. J. Appl. Phys. , vol.43 , pp. 2402
- Nakashima, H.¹ Wang, D.² Noguchi, T.³ Itani, K.⁴ Wang, J.⁵ Zhao, L.⁶

11
- 41649101225
- K. Iwamoto, Y. Kamimuta, A. Ogawa, Y. Watanabe, S. Migita, W. Mizubayashi, Y. Morita, M. Takahashi, H. Ota, T. Nabatame, and A. Toriumi: Appl. Phys. Lett. 92 (2008) 132907.
- (2008) Appl. Phys. Lett. , vol.92 , pp. 132907
- Iwamoto, K.¹ Kamimuta, Y.² Ogawa, A.³ Watanabe, Y.⁴ Migita, S.⁵ Mizubayashi, W.⁶ Morita, Y.⁷ Takahashi, M.⁸ Ota, H.⁹ Nabatame, T.¹⁰ Toriumi, A.¹¹

12
- 0004071496
- Wiley, Hoboken, NJ, IEEE Press 3rd ed.
- D. K. Schroder: Semiconductor Material and Device Characterization (Wiley, Hoboken, NJ, 2006) IEEE Press 3rd ed., p. 335.
- (2006) Semiconductor Material and Device Characterization , pp. 335
- Schroder, D.K.¹

13
- 76049125028
- H. Yang, D. Wang, H. Nakashima, K. Hirayama, S. Kojima, and S. Ikeura: Thin Solid Films 518 (2010) 2342.
- (2010) Thin Solid Films , vol.518 , pp. 2342
- Yang, H.¹ Wang, D.² Nakashima, H.³ Hirayama, K.⁴ Kojima, S.⁵ Ikeura, S.⁶

14
- 77954531958
- H. Yang, M. Iyota, S. Ikeura, D. Wang, and H. Nakashima: Appl. Phys. Express 3 (2010) 071302.
- (2010) Appl. Phys. Express , vol.3 , pp. 071302
- Yang, H.¹ Iyota, M.² Ikeura, S.³ Wang, D.⁴ Nakashima, H.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.