Distortion of single-particleoptical sensing (SPOS) particle count by sub-countable particles

Particle and Particle Systems Characterization

Volumn 27, Issue 1-2, 2010, Pages 21-31

  Tolla, Bruno ^a,b   Boldridge, David ^a  

^a CABOT MICROELECTRONICS CORPORATION   (United States)

^b Sun Chemical Corporation   (United States)

Author keywords

Coincidence; Large particle count; SPOS

Indexed keywords

COINCIDENCE; FUMED SILICAS; HIGHLY SENSITIVE; LARGE PARTICLE COUNT; LARGE PARTICLES; MEAN PARTICLE SIZE; MODEL CALCULATIONS; MONODISPERSE POLYSTYRENE; NONLINEAR FUNCTIONS; OPTICAL SENSING; PARTICLE CHARACTERIZATION; PARTICLE COUNTS; SAMPLE CONCENTRATION; SINGLE PARTICLE; SPOS; SUB-MICRON PARTICLES;

FUNCTIONS; PARTICLE SIZE ANALYSIS; POLYMER BLENDS; POLYSTYRENES; SILICA; SIZE DISTRIBUTION;

PARTICLE SIZE;

EID: 79954514790     PISSN: 09340866     EISSN: 15214117     Source Type: Journal    
DOI: 10.1002/ppsc.200900081     Document Type: Article

References (34)

1. D. F. Nicoli, P. O'Hagan, G. Pokrajac, K. Hasapidis, High-Sensitivity Particle Size Analysis of Colloidal Suspensions (CMP slurries) by SPOS: Where Less Becomes More. Am. Lab. 2000, 32, 18-22.
2. D. F. Nicoli, K. Hasapidis, P. O'Hagan, G. Pokrajac, B. Schade, Particle Size Analysis of Colloidal Suspensions by SPOS Compared to DLS: A Sensitive Iindicator of Quality and Stability. Am. Lab. 2001, 33, 32-39.
3. P. B. Zantye, A. Kumar, A. K. Sikder, Chemical Mechanical Planarization for Microelectronics Applications. Mater. Sci. Eng., R. 2004, 45, 89-220.
4. J. M. Steigerwald, S. P. Murarka, R. J. Gutman, Chemical Mechanical Planarization of Microelectronics Materials. JohnWiley and Sons, New York, 1997, p. 337.
5. E. E. Remsen, S. Anjur, D. Boldridge, M. Kamiti, S. Li, T. Johns, C. Dowell, J. Kasthurirangan, P. Feeney, Analysis of Large Particle Count in Fumed Silica Slurries and Its Correlation with Scratch Defects Generated by CMP. J. Electrochem. Soc. 2006, 153, G453-G461.
6. E. E. Remsen, S. P. Anjur, D. Boldridge, M. Kamiti, S. Li, Correlation of Defects on Dielectric Surfaces with Large Particle Counts in Chemical-Mechanical Planarization (CMP) Slurries Using a New Single Particle Optical Sensing (SPOS) Technique. Mater. Res. Soc. Symp. Proc. 2005, 867, 57-62. (Pubitemid 43079461)
7. G. B. Basim, B. M. Moudgil, Effect of Soft Agglomerates on CMP Slurry Performance. J. Colloid Interface Sci. 2002, 256, 137-142. (Pubitemid 36164585)
8. M. Stintz, H. Barthel, M. Moinpour, Particle Metrology in CMP Slurries-Potential and Limitations of Relevant Measuring Methods. Mater. Res. Soc. Symp. Proc. 2007, 991, 107-119.
9. L. Doyen, D. Vacher, F. K. Tarutani, P. Bouard, F. Picore, D. Girard, Analyzing Large Particles in CMP Slurries. Semicond. Int. 2002, 25, 75-78.
10. L. Anthony, J. Miner, M. Baker, W. Lai, J. Sowell, A. Maury, Y. Obeng, The How's andWhy's of Characterizing Particle Size Distributions in CMP Slurries. Electrochem. Soc. Proc. 1998, 98-7, 181-196.
11. K. Nicholes, R. Singh, D. Grant, M. Litchy, Measuring Particles in CMP Slurries. Semicond. Int. 2001, 24, 201-206.
12. J. P. Bare, T. A. Lemke, Monitoring Slurry Stability to Reduce Process Variability: Measuring the Density and pH of a Slurry and Profiling its Particle-Size Distribution Can Help Reduce CMP Process Variability. Micro 1997, 15, 53-63.
13. L. H. Hanus, S. A. Battafarano, A. R. Wank, Optimizing the Sizing and Counting Accuracy of CMP Slurry Large Particle Counts (LPC). Micro 2003, 21, 71-80.
14. K. Nicholes, M. R. Litchy, E. Hood, W. G. Easter, V. B. Bhethanabotla, L. Cheema, D. Grant, Analysis of Wafer Defects Caused by Large Particles in CMP Slurry Using Light Scattering and SEM Measurement Techniques. Proc. 8th Int. CMP-MIC 2003, 221-226.
15. J. Kasthurirangan, J. Parker, T. Bettis, C. Dowell, Low Defect Ceria for ILD CMP. Mater. Res. Soc. Symp. Proc. 2007, 991, 125-132.
16. D. DeNardis, H. Choi, A. Kim, M. Moinpour, A. Oehler, Investigating the Effects of Diluting Solutions and Trace Metal Contamination on Aggregation Characteristics of Silica-Based ILD CMP Slurries. Mater. Res. Soc. Symp. Proc. 2005, 867, 159-166.
17. M. Bielmann, U. Mahajan, R. K. Singh, Effect of Particle Size During Tungsten Chemical Mechanical Polishing. Electrochem. Solid-State Lett. 1999, 2, 401-403.
18. D. F. Nicoli, V. B. Elings, U. S. Pat. 4,794,806 (1989).
19. K. T. Whitby, B. Y. H. Liu, Generation of Countable Pulses by High Concentrations of Subcountable Sized Particles in the Sensing Volume of Optical Counters. J. Colloid Interface Sci. 1967, 25, 537-546.
20. R. Jaenicke, The Optical Particle Counter: Cross-Sensitivity and Coincidence. J. Aerosol Sci. 1972, 3, 95-111.
21. H. Bader, H. R. Gordon, O. B. Brown, Theory of Coincidence Counts and Simple Practical Methods of Coincidence Count Correction for Optical and Resistive Pulse Particle Counters. Rev. Sci. Instrum. 1972, 43, 1407-1412.
22. B. Y. H. Liu, R. N. Berglund, J. K. Agarwal, Experimental Studies of Optical Particle Counters. Atmos. Environ. 1974, 8, 717-732.
23. D. M. Knotter, S. A. M. Wolters, M. A. Kasanrokijat, Particle Concentration Measurements in Process Liquids Using Light-Scattering Techniques. Part. Sci. Technol. 2007, 25, 435-447. (Pubitemid 47450637)
24. J. Raasch, H. Umhauer, Errors in the Determination of Particle Size Distributions Caused by Coincidences in Optical Particle Counters. Part. Part. Syst. Charact. 1984, 1, 53-58. (Pubitemid 16492374)
25. E. J. W. Wynn, M. J. Hounslow, Coincidence Correction for Electrical-Zone (Coulter-Counter) Particle Size Analysers. Powder Technol. 1997, 93, 163-176.
26. J. L. Brenguier, L. Amodei, Coincidence and Dead-Time Corrections for Particle Counters. Part I: A General Mathematical Formalism. J. Atmos. Ocean. Technol. 1989, 6, 575-584.
27. J. L. Brenguier, Coincidence and Dead-Time Corrections for Particles Counters. Part II: High Concentration Measurements with an FSSP. J. Atmos. Ocean. Technol. 1989, 6, 585-598.
28. J. Gregory, Turbidity Fluctuations in Flowing Suspensions. J. Colloid Interface Sci. 1985, 105, 357-371.
29. J. Gregory, D. W. Nelson, Monitoring of Aggregates in Flowing Suspensions. Colloids Surf. 1986, 18, 175-188.
30. W. C. Hinds, Aerosol Technology. John Wiley and Sons, New York, 1982, p. 325.
31. T. Hatch, S. P. Choate, Statistical Description of the Size Properties of Non-Uniform Particulate Substances. J. Franklin Inst. 1929, 207, 369-387.
32. Thermo Scientific, Inc. Derivation of Count per Milliliter from% Solids. Technical Note TN 17.02A, 2006.
33. Y. Liu, P. Daum, The Effect of Refractive Index on Size Distributions and Light Scattering Coefficients Derived from Optical Particle Counters. J. Aerosol Sci. 2000, 31, 945-957. (Pubitemid 30316402)
34. S. K. R. Williams, I. Park, E. Remsen, M. Moinpour, New Particle Metrology for CMP Slurries. Mat. Res. Soc. Symp. Proc. 2007, 991, 249-254. (Pubitemid 351154556)