Analysis of large particle count in fumed silica slurries and its correlation with scratch defects generated by CMP

Journal of the Electrochemical Society

Volumn 153, Issue 5, 2006, Pages

  Remsen, Edward E ^a   Anjur, Sriram ^a   Boldridge, David ^a   Kamiti, Mungai ^a   Li, Shoutian ^a   Johns, Timothy ^a   Dowell, Charles ^a   Kasthurirangan, Jaishankar ^a   Feeney, Paul ^a  

^a CABOT MICROELECTRONICS CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING; DEFECTS; PARTICLE SIZE ANALYSIS; SENSORS; SLURRIES;

SCRATCH DEFECTS; SCRATCH-FORMING PARTICLES; SINGLE PARTICLE OPTICAL SENSING (SPOS); SPOS MEASUREMENTS;

SILICA;

EID: 33645660019     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2184036     Document Type: Article

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