Effect of soft agglomerates on CMP slurry performance

Journal of Colloid and Interface Science

Volumn 256, Issue 1, 2002, Pages 137-142

  Basim, G Bahar ^a   Moudgil, Brij M ^a,b  

^a J Crayton Pruitt Family Department of Biomedical Engineering   (United States)

^b 205 Particle Sci/Technol Building ^*  (United States)

Author keywords

Chemical mechanical polishing (CMP); Dry aggregation; Polymer flocculation; Salt coagulation; Silica silica polishing; Slurry particle size distribution; Soft agglomerates

Indexed keywords

ABRASIVES; CHEMICAL MECHANICAL POLISHING; IONIC STRENGTH; PH EFFECTS; SLURRIES; SURFACE ROUGHNESS;

ROBUST DISPERSION SCHEMES;

AGGLOMERATION;

POLYMER; SILICON DIOXIDE;

ARTICLE; FLOCCULATION; IONIC STRENGTH; PARTICLE SIZE; PH; PRESSURE; PRIORITY JOURNAL; TEMPERATURE SENSITIVITY;

EID: 0036973181     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1006/jcis.2002.8352     Document Type: Article

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