Optimizing the sizing and counting accuracy of CMP slurry large-particle counts

MICRO

Volumn 21, Issue 5, 2003, Pages 71-79

  Hanus, Leo H ^a   Battafarano, Stephen A ^b   Wank, Andrew R ^c  

^a CLARIANT CORPORATION   (United States)

^b ROHM AND HAAS COMPANY   (United States)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

CHROMATOGRAPHY; HYDRODYNAMICS; PARTICLE SIZE ANALYSIS; SLURRIES;

OPTICAL SIZING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0037930583     PISSN: 10810595     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

1. 2 (June 1999 [cited 6 May 2003]); available from Internet: www.a2c2.com/articles/99june_087.asp?pid= 161&articleText=99june_087.
2. JP Bare and TA Lemke, "Monitoring Slurry Stability to Reduce Process Variability, "MICRO 15, no. 8 (1997): 53-63.
3. T Provder, "Challenges in Particle Size Distribution Measurement Past, Present, and for the 21st Century," Progress in Organic Coatings 32 (1997): 143-153.
4. RJ Haskell, "Characterization of Submicron Systems via Optical Methods," Journal of Pharmaceutical Science 87, no. 2 (1998): 125-129.
5. HG Barth and RB Flippen, "Particle Size Analysis," Analytical Chemistry 67, no. 12 (1995): 257R-272R.
6. "AccuSizer 770 User Manual" (Santa Barbara, CA: Particle Sizing Systems, 1997), 4.
7. M Litchy, K Nicholes, and DC Grant, "Comparison of Instruments Used for Measuring Concentrations of Large Particles (≥1μm) in CMP Slurry," in Proceedings of the Fifth International Conference on CMP for ULSI Multilevel Interconnection (CMP-MIC) (Tampa, FL: IMIC, 2000), 570-573.