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Volumn 509, Issue 20, 2011, Pages 6090-6095
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Metalorganic chemical vapor deposition of Ti-O-C-N thin films using TBOT as a promising precursor
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Author keywords
MOCVD; SEM; Ti O C N thin films; XPS; XRD
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Indexed keywords
MOCVD;
SEM;
TI-O-C-N THIN FILMS;
XPS;
XRD;
CARBON FILMS;
DEPOSITION;
GASES;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
NITROGEN;
OXIDE MINERALS;
OXYGEN;
THIN FILMS;
TITANIUM;
TITANIUM CARBIDE;
TITANIUM DIOXIDE;
TITANIUM NITRIDE;
VAPOR DEPOSITION;
X RAY PHOTOELECTRON SPECTROSCOPY;
PROCESS CONTROL;
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EID: 79954425136
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2011.03.030 Document Type: Article |
Times cited : (8)
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References (22)
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