SCOPUS 정보 검색 플랫폼

Volumn 234, Issue 2-3, 2002, Pages 440-446

Preparation and properties of TiSi2 thin films from TiCl4/H2 by plasma enhanced chemical vapor deposition

(6) Fouad, O A a Yamazato, M a Era, M a Nagano, M a Hirai, T b Usui, I b

b Industrial Technology Center of Saga (Japan)

Author keywords

A1. Crystal structure; A1. Interfaces; A1. X ray diffraction; A3. Chemical vapor deposition processes; B1. Titanium compounds

Indexed keywords

CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; POLYCRYSTALLINE MATERIALS; TITANIUM COMPOUNDS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

LOW REACTIVITY PHASES;

THIN FILMS;

EID: 0036131509 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-0248(01)01707-9 Document Type: Article

Times cited : (13)

References (26)

1
- 0027906599
- (1993) Appl. Surf. Sci. , vol.73 , pp. 25
- Gouy-Pailler, P.¹ Haond, M.² Mathiot, D.³ Gauneau, M.⁴ Perio, A.⁵ Regolini, J.L.⁶

2
- 0029771149
- (1996) Mater. Res. Soc. Symp. Proc. , vol.402 , pp. 283
- Maury, D.¹ Regolini, J.L.² Gayet, P.³

3
- 0032184425
- (1998) J. Crystal Growth , vol.193 , pp. 322
- Ohshita, Y.¹ Oshida, M.² Seki, M.³ Watanabe, K.⁴

4
- 0000648128
- (1996) J. Vac. Sci. Technol. A , vol.14 , pp. 928
- Southwell, R.P.¹ Mendicino, M.A.² Seebauer, E.G.³

5
- 0024091548
- (1988) J. Electrochem. Soc. , vol.135 , pp. 2590
- Ilderem, V.¹ Reif, R.²

6
- 0032205209
- (1998) J. Electrochem. Soc. , vol.145 , pp. 3941
- Byun, J.S.¹ Choi, S.J.² Kim, J.J.³ Choi, J.T.⁴ Swenberg, J.⁵ Achutharaman, R.⁶

7
- 0023400134
- (1987) J. Electrochem. Soc. , vol.134 , pp. 2080
- Bouteville, A.¹ Royer, A.² Remy, J.C.³

8
- 0006589073
- (1988) Appl. Phys. Lett. , vol.53 , pp. 687
- Ilderem, V.¹ Reif, R.²

9
- 0000283765
- (1989) Appl. Phys. Lett. , vol.55 , pp. 1549
- Bensahel, D.¹ Regolini, J.L.²

10
- 0025398938
- (1990) J. Electron. Mater. , vol.19 , pp. 253
- Mercier, J.¹ Regolini, J.L.² Bensahel, D.³

11
- 0025261537
- (1990) Jpn. J. Appl. Phys. , vol.29
- Saito, K.¹ Amazawa, T.² Arita, Y.³

12
- 0026139036
- (1991) J. Electron. Mater. , vol.20 , pp. 331
- Lee, J.G.¹ Reif, R.²

13
- 0027541980
- (1993) J. Electrochem. Soc. , vol.140 , pp. 513
- Saito, K.¹ Amazawa, T.² Arita, Y.³

14
- 0028733002
- (1994) Thin Solid Films , vol.253 , pp. 473
- Mendicino, M.A.¹ Southwell, R.P.² Seebauer, E.G.³

15
- 0027813353
- (1993) J. Crystal Growth , vol.134 , pp. 377
- Mendicino, M.A.¹ Seebauer, E.G.²

16
- 0000822903
- (1989) J. Appl. Phys. , vol.65 , pp. 3212
- Reynolds, G.J.¹ Cooper III, C.B.² Gaczi, P.J.³

17
- 0029736578
- (1996) Mater. Res. Soc. Symp. Proc. , vol.402 , pp. 295
- Gladden, D.B.¹ Weintraub, C.E.² ÖztÜrk, M.C.³

18
- 0028468329
- (1994) J. Electrochem. Soc. , vol.141 , pp. 1879
- Saito, K.¹ Higashi, Y.² Amazawa, T.³ Arita, Y.⁴

19
- 0021502342
- (1984) J. Vac. Sci. Technol. B , vol.2 , pp. 733
- Rosler, R.S.¹ Engle, G.M.²

20
- 0026843284
- (1992) J. Electrochem. Soc. , vol.139 , pp. 1159
- Lee, J.¹ Reif, R.²

21
- 0026846015
- (1992) J. Electrochem. Soc. , vol.139 , pp. 1166
- Lee, J.¹ Reif, R.²

22
- 0030284313
- (1996) J. Electrochem. Soc. , vol.143 , pp. 3778
- Saito, K.¹ Arita, Y.²

23
- 0006614165
- JCPDS card No. 35-0785

24
- 0029391972
- (1995) J. Electrochem. Soc. , vol.142 , pp. 3569
- Tezuka, Y.¹ Kitano, N.² Nakano, N.³

25
- 0003459529
- Physical Electronics Inc., Minnesota
- (1995) Handbook of X-ray Photoelectron Spectroscopy , pp. 6
- Chastain, J.¹ King R.C., Jr.²

26
- 0003486204
- Springer, Berlin
- (1977) Thermochemical Properties of Inorganic Substances , pp. 316
- Barin, I.¹ Knacke, O.² Kubaschewski, O.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.