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Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 27, Issue 3, 2009, Pages 1180-1190

Ion beam sputtering of Ta2 O5 films on thermoplast substrates as waveguides for biosensors

(9) Kulisch, W a Gilliland, D a Ceccone, G a Sirghi, L a Rauscher, H a Gibson, P N a Zurn M a Bretagnol, F a Rossi, F a

a JOINT RESEARCH CENTRE (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; BEAM PLASMA INTERACTIONS; BIOSENSORS; EXPERIMENTS; FILM GROWTH; ION BEAMS; IONS; ORGANIC POLYMERS; OXYGEN; PARTIAL PRESSURE; REFRACTIVE INDEX; SUBSTRATES; TANTALUM; TANTALUM OXIDES; ULTRAVIOLET RADIATION; WAVEGUIDES;

DEPOSITION PROCESS; DUAL ION BEAM SPUTTERING; EPOXY GROUP; EXTINCTION COEFFICIENTS; GROWING FILMS; HIGH OXYGEN PARTIAL PRESSURE; HIGH TEMPERATURE; ION-BEAM SPUTTERING; OPTICAL GRATING; OXYGEN PARTIAL PRESSURE; RESOLUTION LIMITS; ROOM TEMPERATURE; STOICHIOMETRIC FILMS; TANTALUM PENTOXIDE; UV RADIATION;

ION BOMBARDMENT;

EID: 79953847787 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3137965 Document Type: Conference Paper

Times cited : (5)

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