Nondestructive measurement of interfacial SiO2 films formed during deposition and annealing of Ta2O5

Applied Physics Letters

Volumn , Issue , 1995, Pages 1924-

  Devine, R A B ^a  

^a ORANGE LABS   (France)

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EID: 36449006978     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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