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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 4, 2008, Pages 991-995

Ion beam deposition of tantalum pentoxide thin film at room temperature

(7) Kulisch, W a Gilliland, D a Ceccone, G a Rauscher, H a Sirghi, L a Colpo, P a Rossi, F a

a JOINT RESEARCH CENTRE (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; BEAM PLASMA INTERACTIONS; CHEMICAL MODIFICATION; COTTON FIBERS; DEPOSITS; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; INFRARED SPECTROSCOPY; ION BEAMS; ION BOMBARDMENT; MICROSCOPIC EXAMINATION; MOLECULAR ORBITALS; MOLECULAR SPECTROSCOPY; OPTICAL PROPERTIES; ORGANIC POLYMERS; OXYGEN; PARTIAL PRESSURE; PHOTOELECTRON SPECTROSCOPY; REACTIVE SPUTTERING; REFRACTIVE INDEX; SCANNING PROBE MICROSCOPY; SOLIDS; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; SPUTTER DEPOSITION; STOICHIOMETRY; SURFACE ROUGHNESS; TANTALUM; TANTALUM COMPOUNDS; THICK FILMS; THIN FILMS; TRANSITION METALS; ULTRAVIOLET SPECTROSCOPY; VAPOR DEPOSITION; X RAY FILMS;

(001) PARAMETER; (1 1 0) SURFACE; ABSORPTION EDGES; ATOMIC FORCE (AF); DETECTION LIMIT (DL); ELLIPSOMETER; EXTINCTION COEFFICIENT (K); FOURIER TRANSFORM INFRARED SPECTROSCOPY (MIT FTIR); HIGH TRANSMISSION; ION BEAM DEPOSITION (IBD); OXYGEN PARTIAL PRESSURE (OPP); REACTIVE ION BEAM SPUTTERING; ROOM-TEMPERATURE (RT); STOICHIOMETRIC FILMS; TANTALUM PENTOXIDE (TA2O5); UV VIS SPECTROSCOPY; UV VIS SPECTRUM; WIDE WAVELENGTH; X RAY PHOTOELECTRON SPECTROSCOPY (XPS);

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 46449113992 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.2832407 Document Type: Article

Times cited : (10)

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