메뉴 건너뛰기




Volumn 23, Issue 2, 2007, Pages 443-451

Formation of dense self-assembled monolayers of (n-decyl)trichlorosilanes on Ta/Ta2O5

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; INTERFACES (MATERIALS); PASSIVATION; SELF ASSEMBLY; SILANES; TANTALUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33846883963     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la061951e     Document Type: Article
Times cited : (36)

References (60)
  • 15
  • 23
    • 33846876609 scopus 로고    scopus 로고
    • Ph.D. Thesis, University of Twente, Twente
    • Flink, S. Ph.D. Thesis, University of Twente, Twente, 2000.
    • (2000)
    • Flink, S.1
  • 43
    • 0003494870 scopus 로고
    • Elsevier Science & Technology Books: New York
    • Vossen, J. L.; Kern, W. Thin film processes; Elsevier Science & Technology Books: New York, 1978.
    • (1978) Thin film processes
    • Vossen, J.L.1    Kern, W.2
  • 51
    • 33846890027 scopus 로고    scopus 로고
    • (51 ) The calculations are performed based on the kinetic energy (KE) of the electrons, the photoionization asymmetry parameter (β), the inelastic mean free path (IMFP), and the transport mean free path (TMFP). The KE of the electrons is defined as the difference between the X-ray energy and the core electron binding of tantalum (BE). The X-ray energy of the Al Ka source is 1486.6 eV.
    • (51 ) The calculations are performed based on the kinetic energy (KE) of the electrons, the photoionization asymmetry parameter (β), the inelastic mean free path (IMFP), and the transport mean free path (TMFP). The KE of the electrons is defined as the difference between the X-ray energy and the core electron binding of tantalum (BE). The X-ray energy of the Al Ka source is 1486.6 eV.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.