Fabrication of a GHz band surface acoustic wave filter by UV-nanoimprint with an HSQ stamp

Journal of Micromechanics and Microengineering

Volumn 21, Issue 4, 2011, Pages

  Chen, Nian Huei ^a   Huang, Ju Chun ^a   Wang, Chiu Yen ^a   Huang, Fon Shan ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AL/TI FILMS; BEAM DOSE; CENTER FREQUENCY; ELECTRICAL CHARACTERIZATION; GHZ BAND; HEATING CYCLES; HIGH ASPECT RATIO; HIGH HARDNESS; HYDROGEN SILSESQUIOXANE; INTERDIGITAL TRANSDUCER; KEY TECHNIQUES; LAYERED STRUCTURES; LIFT-OFF PROCESS; LOW PRESSURES; NETWORK ANALYZER; NIOBATES; POSTEXPOSURE BAKE; REACTIVE ION; RESIDUAL LAYERS; ROOM TEMPERATURE; SA WFILTER; SURFACE ACOUSTIC WAVE FILTERS; UV CURABLE; UV LIGHT; UV-NANOIMPRINT; UV-NANOIMPRINT LITHOGRAPHY;

ACOUSTIC WAVES; ACOUSTICS; ACOUSTOELECTRIC EFFECTS; ASPECT RATIO; CURING; ELECTRIC NETWORK ANALYSIS; ELECTRON BEAM LITHOGRAPHY; FABRICATION; NANOIMPRINT LITHOGRAPHY; NIOBIUM COMPOUNDS; REACTIVE ION ETCHING; ULTRASONIC TRANSDUCERS;

ACOUSTIC SURFACE WAVE FILTERS;

EID: 79953654233     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/21/4/045021     Document Type: Article

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