UV-nanoimprint for 9 GHz SAW filter fabrication

Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, NSTI-Nanotech, Nanotechnology 2008

Volumn 3, Issue , 2008, Pages 211-214

  Chen, Nian Huei ^a   Liao, Chen Liang ^a   Chen, Henry J H ^b   Lin, C H ^c   Huang, Fon Shan ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL CHI NAN UNIVERSITY   (Taiwan)

^c NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

Surface acoustic wave filter; UV nanoimprint

Indexed keywords

ACOUSTIC SURFACE WAVE DEVICES; ACOUSTIC WAVE VELOCITY; ACOUSTIC WAVES; ACOUSTICS; ASPECT RATIO; CARBON DIOXIDE ARC WELDING; COMMERCE; CONCENTRATION (PROCESS); CURING; ELECTRIC CURRENTS; ELECTRON BEAM LITHOGRAPHY; EXHIBITIONS; NANOIMPRINT LITHOGRAPHY; NANOTECHNOLOGY; OPTICAL DESIGN; PHOTONICS; PHOTORESISTS; SAWING; TECHNOLOGY; ULTRASONIC TRANSDUCERS; WAVE FILTERS;

ETCHING TIME; HIGH ASPECT RATIO; INTER-DIGITAL TRANSDUCER; KEY TECHNIQUES; LOW-DOSE; NANO IMPRINTS; POST-EXPOSURE BAKE; SAW FILTERS; SURFACE ACOUSTIC WAVE; SURFACE ACOUSTIC WAVE FILTER; TRADE SHOWS; UV NANO IMPRINT LITHOGRAPHY; UV NANOIMPRINT; UV-CURABLE;

ACOUSTIC SURFACE WAVE FILTERS;

EID: 52649109671     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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