-
1
-
-
33644591740
-
Thinfilm polarizers for the OMEGA EP Laser System
-
J. B. Oliver, A. L. Rigatti, J. D. Howe, J. Keck, J. Szczepanski, A. W. Schmid, S. Papernov, A. Kozlov, and T. Z. Kosc, "Thinfilm polarizers for the OMEGA EP Laser System," Proc. SPIE 5991, 394-401 (2005).
-
(2005)
Proc. SPIE
, vol.5991
, pp. 394-401
-
-
Oliver, J.B.1
Rigatti, A.L.2
Howe, J.D.3
Keck, J.4
Szczepanski, J.5
Schmid, A.W.6
Papernov, S.7
Kozlov, A.8
Kosc, T.Z.9
-
3
-
-
0027186844
-
Propagation of light pulses in a chirped-pulse-amplification laser
-
DOI 10.1109/3.199268
-
Y.-H. Chuang, L. Zheng, and D. D. Meyerhofer, "Propagation of light pulses in a chirped-pulse-amplification laser," IEEE J. Quantum Electron. 29, 270-280 (1993). (Pubitemid 23612067)
-
(1993)
IEEE Journal of Quantum Electronics
, vol.29
, Issue.1
, pp. 270-280
-
-
Chuang, Y.-H.1
Zheng, L.2
Meyerhofer, D.D.3
-
4
-
-
0000282358
-
Residual stresses in evaporated silicon dioxide thin films: Correlation with deposition parameters and aging behavior
-
H. Leplan, B. Geenen, J. Y. Robic, and Y. Pauleau, "Residual stresses in evaporated silicon dioxide thin films: Correlation with deposition parameters and aging behavior," J. Appl. Phys. 78, 962-968 (1995).
-
(1995)
J. Appl. Phys.
, vol.78
, pp. 962-968
-
-
Leplan, H.1
Geenen, B.2
Robic, J.Y.3
Pauleau, Y.4
-
5
-
-
62149117908
-
Low stress ion-assisted coatings on fused silica substrates for large aperture laser pulse compression gratings
-
D. J. Smith, M. McCullough, C. Smith, T. Mikami, and T. Jitsuno, "Low stress ion-assisted coatings on fused silica substrates for large aperture laser pulse compression gratings," Proc. SPIE 7132, 71320E (2008).
-
(2008)
Proc. SPIE
, vol.7132
-
-
Smith, D.J.1
McCullough, M.2
Smith, C.3
Mikami, T.4
Jitsuno, T.5
-
6
-
-
0033901956
-
2 films with high laser damage threshold
-
DOI 10.1016/S0040-6090(99)00690-2
-
2 films with high laser damage threshold," Thin Solid Films 358, 250-258 (2000). (Pubitemid 30526401)
-
(2000)
Thin Solid Films
, vol.358
, Issue.1
, pp. 250-258
-
-
Alvisi, M.1
Di Giulio, M.2
Marrone, S.G.3
Perrone, M.R.4
Protopapa, M.L.5
Valentini, A.6
Vasanelli, L.7
-
7
-
-
0036574788
-
2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition
-
DOI 10.1016/S0040-6090(02)00208-0, PII S0040609002002080
-
2 single layers deposited by reactive evaporation, ion-assisted deposition and plasma ion-assisted deposition," Thin Solid Films 410, 86-93 (2002). (Pubitemid 34613864)
-
(2002)
Thin Solid Films
, vol.410
, Issue.1-2
, pp. 86-93
-
-
Thielsch, R.1
Gatto, A.2
Heber, J.3
Kaiser, N.4
-
8
-
-
33750444617
-
Characterisation of optical thin films obtained by plasma ion assisted deposition
-
F. Placido, D. Gibson, E.Waddell, and E. Crossan, "Characterisation of optical thin films obtained by plasma ion assisted deposition," Proc. SPIE 6286, 628602 (2006).
-
(2006)
Proc. SPIE
, vol.6286
, pp. 628602
-
-
Placido, F.1
Gibson, D.2
Waddell, E.3
Crossan, E.4
-
11
-
-
0019315250
-
THIN FILM ANNEALING BY ION BOMBARDMENT.
-
DOI 10.1016/0040-6090(80)90207-2
-
E. H. Hirsch and I. K. Varga, "Thin film annealing by ion bombardment," Thin Solid Films 69, 99-105 (1980). (Pubitemid 11429565)
-
(1980)
Thin Solid Films
, vol.69
, Issue.1
, pp. 99-105
-
-
Hirsch, E.H.1
Varga, I.K.2
-
12
-
-
0038058152
-
Ion-assisted deposition
-
F. R. Flory ed. (Marcel Dekker)
-
B. G. Bovard, "Ion-assisted deposition," in Thin Films for Optical Systems, F. R. Flory ed. (Marcel Dekker, 1995), pp. 117-132.
-
(1995)
Thin Films for Optical Systems
, pp. 117-132
-
-
Bovard, B.G.1
-
13
-
-
0242384950
-
Substrate heating using several configurations of an end-hall ion source
-
Society of Vacuum Coaters, paper 110
-
J. R. Kahn, H. R. Kaufman, and V. V. Zhurin, "Substrate heating using several configurations of an end-hall ion source," in 46th Annual Technical Conference Proceedings (Society of Vacuum Coaters, 2003), pp. 621-625 (paper 110).
-
(2003)
46th Annual Technical Conference Proceedings
, pp. 621-625
-
-
Kahn, J.R.1
Kaufman, H.R.2
Zhurin, V.V.3
-
14
-
-
0031632290
-
Measurement and correlation of ion beam current density to moisture stability of oxide film stacks fabricated by cold cathode ion assisted deposition
-
Society of Vacuum Coaters, paper 53
-
D. E. Morton and V. Fridman, "Measurement and correlation of ion beam current density to moisture stability of oxide film stacks fabricated by cold cathode ion assisted deposition," in Proceedings of the 41st Annual Technical Conference of the Society of Vacuum Coaters (Society of Vacuum Coaters, 2003), pp. 297-302 (paper 53).
-
(2003)
Proceedings of the 41st Annual Technical Conference of the Society of Vacuum Coaters
, pp. 297-302
-
-
Morton, D.E.1
Fridman, V.2
-
15
-
-
84945773226
-
Monte Carlo calculation for structural modifications in ion-assisted thin film deposition due to thermal spikes
-
K.-H. Müller, "Monte Carlo calculation for structural modifications in ion-assisted thin film deposition due to thermal spikes," J. Vac. Sci. Technol. A 4, 184-188 (1986).
-
(1986)
J. Vac. Sci. Technol. A
, vol.4
, pp. 184-188
-
-
Müller, K.-H.1
-
16
-
-
0001506662
-
Verification of momentum transfer as the dominant densifying mechanism in ionassisted deposition
-
J. D. Targove and H. A. Macleod, "Verification of momentum transfer as the dominant densifying mechanism in ionassisted deposition," Appl. Opt. 27, 3779-3781 (1988).
-
(1988)
Appl. Opt.
, vol.27
, pp. 3779-3781
-
-
Targove, J.D.1
Macleod, H.A.2
-
18
-
-
0029270879
-
On the ion energy transfer to the substrate during titanium deposition in a hallow cathode arc discharge
-
H. Kersten, H. Steffen, D. Vender, and H. E. Wagner, "On the ion energy transfer to the substrate during titanium deposition in a hallow cathode arc discharge," Vacuum 46, 305-308 (1995).
-
(1995)
Vacuum
, vol.46
, pp. 305-308
-
-
Kersten, H.1
Steffen, H.2
Vender, D.3
Wagner, H.E.4
-
19
-
-
0002376980
-
Structure of evaporated metal films
-
J. R. Anderson ed., Physical Chemistry, a Series of Monographs (Academic)
-
J. V. Sanders, "Structure of evaporated metal films," in Chemisorption and Reactions on Metallic Films, J. R. Anderson ed., Physical Chemistry, a Series of Monographs (Academic, 1971), pp. 1-38.
-
(1971)
Chemisorption and Reactions on Metallic Films
, pp. 1-38
-
-
Sanders, J.V.1
-
20
-
-
0024138323
-
Structure-zone models of thin films
-
J. A. Thorton, "Structure-zone models of thin films," Proc. SPIE 821, 95-103 (1988).
-
(1988)
Proc. SPIE
, vol.821
, pp. 95-103
-
-
Thorton, J.A.1
-
21
-
-
0014612979
-
Structure and properties of thick vacuum-condensates of nickel, titanium, tungsten, aluminum oxide, and zirconium dioxide
-
B. A. Movchan and A. V. Demchishin, "Structure and properties of thick vacuum-condensates of nickel, titanium, tungsten, aluminum oxide, and zirconium dioxide," Fiz. Met. Metalloved. 28, 653-660 (1969).
-
(1969)
Fiz. Met. Metalloved.
, vol.28
, pp. 653-660
-
-
Movchan, B.A.1
Demchishin, A.V.2
-
22
-
-
0000073841
-
The tension of metallic films deposited by electrolysis
-
G. G. Stoney, "The tension of metallic films deposited by electrolysis," Proc. R. Soc. London Ser. A 82, 172-175 (1909).
-
(1909)
Proc. R. Soc. London Ser. A
, vol.82
, pp. 172-175
-
-
Stoney, G.G.1
-
23
-
-
33745041322
-
Optimization of deposition uniformity for large-aperture National Ignition Facility substrates in a planetary rotation system
-
DOI 10.1364/AO.45.003097
-
J. B. Oliver and D. Talbot, "Optimization of deposition uniformity for large-aperture National Ignition Facility substrates in a planetary rotation system," Appl. Opt. 45, 3097-3105 (2006). (Pubitemid 43874665)
-
(2006)
Applied Optics
, vol.45
, Issue.13
, pp. 3097-3105
-
-
Oliver, J.B.1
Talbot, D.2
-
24
-
-
84957273361
-
End-Hall ion source
-
H. R. Kaufman, R. S. Robinson, and R. I. Seddon, "End-Hall ion source," J. Vac. Sci. Technol. A 5, 2081-2084 (1987).
-
(1987)
J. Vac. Sci. Technol. A
, vol.5
, pp. 2081-2084
-
-
Kaufman, H.R.1
Robinson, R.S.2
Seddon, R.I.3
-
26
-
-
0031289857
-
2 monolayer thin films
-
DOI 10.1117/12.307018
-
2 monolayer thin films," Proc. SPIE 3244, 434-445 (1998). (Pubitemid 35018088)
-
(1997)
Proceedings of SPIE - The International Society for Optical Engineering
, vol.3244
, pp. 434-445
-
-
Papernov, S.1
Zaksas, D.2
Anzellotti, J.F.3
Smith, D.J.4
Schmid, A.W.5
Collier, D.R.6
Carbone, F.A.7
-
27
-
-
0001079224
-
Localized absorption effects during 351 nm, pulsed laser irradiation of dielectric multilayer thin films
-
S. Papernov and A. W. Schmid, "Localized absorption effects during 351 nm, pulsed laser irradiation of dielectric multilayer thin films," J. Appl. Phys. 82, 5422-5432 (1997). (Pubitemid 127584725)
-
(1997)
Journal of Applied Physics
, vol.82
, Issue.11
, pp. 5422-5432
-
-
Papernov, S.1
Schmid, A.W.2
-
28
-
-
85135903767
-
High precision coating technology for large aperture NIF optics
-
Optical Society of America, paper ThD2
-
J. B. Oliver, J. Howe, A. Rigatti, D. J. Smith, and C. Stolz, "High precision coating technology for large aperture NIF optics," in Optical Interference Coatings, OSA Technical Digest (Optical Society of America, 2001), paper ThD2.
-
(2001)
Optical Interference Coatings, OSA Technical Digest
-
-
Oliver, J.B.1
Howe, J.2
Rigatti, A.3
Smith, D.J.4
Stolz, C.5
-
29
-
-
79952785084
-
Thin hafnium oxide and method for depositing same
-
2 May
-
B. Andre, J. Dijon, and B. Rafin, "Thin hafnium oxide and method for depositing same," U.S. patent 7,037,595 (2 May 2006).
-
(2006)
U.S. Patent 7, 037 595
-
-
Andre, B.1
Dijon, J.2
Rafin, B.3
-
30
-
-
62149105121
-
Optimization of laser-damage resistance of evaporated hafnia films at 351 nm
-
J.B. Oliver, S. Papernov, A.W. Schmid, and J.C. Lambropoulos, "Optimization of laser-damage resistance of evaporated hafnia films at 351 nm," Proc. SPIE 7132, 71320J (2008).
-
(2008)
Proc. SPIE
, vol.7132
-
-
Oliver, J.B.1
Papernov, S.2
Schmid, A.W.3
Lambropoulos, J.C.4
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