One step closer to the intrinsic laser-damage threshold of HfO2 and SiO2 monolayer thin films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3244, Issue , 1997, Pages 434-445

  Papernov, S ^a   Zaksas, D ^a   Anzellotti, J F ^a   Smith, D J ^a   Schmid, A W ^a   Collier, D R ^a   Carbone, F A ^a  

^a UNIVERSITY OF ROCHESTER   (United States)

Author keywords

Atomic force microscopy; Damage morphology; Hafnium oxide; Monolayers; Silica

Indexed keywords

ATOMIC FORCE MICROSCOPY; HAFNIUM COMPOUNDS; INTERFACES (MATERIALS); MONOLAYERS; RHEOLOGY; SILICA; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS;

MICROROUGHNESS;

LASER DAMAGE;

EID: 0031289857     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.307018     Document Type: Conference Paper

References (13)

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