Characterisation of optical thin films obtained by plasma ion assisted deposition

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6286, Issue , 2006, Pages

  Placido, Frank ^a   Gibson, Des ^a   Waddell, Ewan ^b   Crossan, Edward ^a  

^a UNIVERSITY OF THE WEST OF SCOTLAND   (United Kingdom)

^b Thin Film Solutions Ltd   (United Kingdom)

Author keywords

Assisted deposition; Plasma source; Silica; Tantala; Thin films; Titania

Indexed keywords

ANODES; CATHODES; DEPOSITION; ELECTRIC POTENTIAL; ELECTROMAGNETIC FIELD EFFECTS; ELLIPSOMETRY; INDENTATION; PLASMA SOURCES; REFRACTIVE INDEX; SILICA; SPECTROPHOTOMETRY; THIN FILMS; TITANIUM DIOXIDE;

NANO INDENTATION; PLASMA ION ASSISTED DEPOSITION (PAD); TANTALA;

OPTICAL FILMS;

EID: 33750444617     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681027     Document Type: Conference Paper

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