Optimization of laser-damage resistance of evaporated hafnia films at 351 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7132, Issue , 2008, Pages

  Oliver, J B ^a   Papernov, S ^a   Schmid, A W ^a   Lambropoulos, J C ^a  

^a UNIVERSITY OF ROCHESTER   (United States)

Author keywords

Hafnia; Laser damage; Nanocluster; Thin film

Indexed keywords

BACKFILL PRESSURES; DAMAGE THRESHOLDS; ELECTRIC-FIELD; ELECTRON-BEAM EVAPORATIONS; HAFNIA; HAFNIUM DIOXIDES; LASER SYSTEMS; LASER-DAMAGE THRESHOLDS; MICRO-STRUCTURAL CHANGES; MONOLAYER FILMS; SYSTEMATIC STUDIES; TEM; TEST CONDITIONS; X-RAY DIFFRACTIONS;

ELECTRON ENERGY LEVELS; FILM PREPARATION; HAFNIUM; LASERS; LIGHT REFRACTION; MONOLAYERS; MULTILAYERS; NANOCLUSTERS; OPTICAL MATERIALS; OXYGEN; REFLECTION; REFRACTIVE INDEX; REFRACTOMETERS; THIN FILM DEVICES; TRANSMISSION ELECTRON MICROSCOPY;

LASER DAMAGE;

EID: 62149105121     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.805383     Document Type: Conference Paper

References (26)

1. A. M. Piegari, M. R. Perrone, and M. L. Protopapa, "Laser damage resistance of thin films for ultraviolet optical components," in Sixth Conference on Optics: 2000, edited by V. I. Vlad, Vol. 4430, pp. 869-881, SPIE, Bellingham, WA, 2001.
2. M. Reichling, A. Bodemann, and N. Kaiser, "Defect induced laser damage in oxide multilayer coatings for 248 run," Thin Solid Films 320, 264-279 (1998).
3. E. J. Hacker, H. Lauth, and P. Weissbrodt, "Review of structural influences of the laser damage thresholds of oxide" in Laser-Induced Damage in Optical Materials: 1995, edited by H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, and M. J. Soileau, Vol. 2714, pp. 316-330, SPIE, Bellingham, WA, 1996.
4. 2 monolayer thin films," in Laser-Induced Damage in Optical Materials: 1997, edited by G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, and M. J. Soileau, Vol. 3244, pp. 434-445, SPIE, Bellingham, WA, 1998.
5. J. H. Apfel, "Optical coating design with reduced electric field intensity," Appl. Opt. 19(7), 1880-1885 (1977).
6. 2 thin films," J. Vac. Sci. Technol. A 20(3), 643-650 (2002).
7. J. B. Oliver and D. Talbot, "Optimization of deposition uniformity for large-aperture National Ignition Facility substrates in a planetary rotation system," Appl. Opt., 45 (13), 3097-3105 (2006).
8. J. B. Oliver, J. Howe, A. Rigatti, D. J. Smith, and C. Stolz, "High precision coating technology for large aperture NIF optics," in Optical Interference Coatings, OSA Technical Digest, p. ThD2, Optical Society of America, Washington, DC, 2001.
9. J. DiJon, B. Rafin, C. Pelle, J. Hue, G. Ravel, and B. Andre, "One-hundred joule per square centimeter 1.06-νm mirrors," in Laser-Induced Damage in Optical Materials: 1999, edited by G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, K. L. Lewis, and M. J. Soileau, Vol. 3902, pp. 158-168, SPIE, Bellingham, WA, 2000.
10. C. J. Stolz, C. L. Weinzapfel, A. L. Rigatti, J. B. Oliver, J. Taniguchi, R. P. Bevis, and J. S. Rajasansi, "Fabrication of meter-scale laser resistant mirrors for the National Ignition Facility: A fusion laser," in Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, edited by A. M. Khounsary, U. Dinger, and K. Ota, Vol. 5193, pp. 50-58, SPIE, Bellingham, WA, 2004.
11. R. Thielsch, A. Gatto, and N. Kaiser, "Mechanical stress and thermal-elastic properties of oxide coatings for use in the deep-ultraviolet spectral region," Appl. Opt. 41(16), 3211-3217 (2002).
12. B. Andre, J. Dijon, and B. Rafin, "Thin hafnium oxide and method for depositing same," U.S. Patent No. 7,037,595 (2 May 2006).
13. H. Leplan, B. Geenen, J. Y. Robic, and Y. Pauleau, "Residual stresses in evaporated silicon dioxide thin films: Correlation with deposition parameters and aging behavior," J. Appl. Phys. 78(2), 962-967 (1995).
14. R. Chow, S. Falabella, G. E. Loomis, F. Rainer, C. J. Stolz, and M. R. Kozlowski, "Reactive evaporation of low-defect density hafnia," Appl. Opt. 32(28), 5567-5574 (1993).
15. C. J. Stolz, L. M. Sheehan, M. K. Von Gunten, R. P. Bevis, and D. J. Smith, "Advantages of evaporation of hafnium in a reactive environment for manufacture of high-damage-threshold multilayer coatings by electron-beam deposition," in Advances in Optical Interference Coatings, edited by C. Amra and H. A. Macleod, Vol. 3738, pp. 318-324, SPIE, Bellingham, WA, 1999.
16. L. B. Freund and S. Suresh, Thin Film Materials: Stress, Defect Formation, and Surface Evolution, Cambridge University Press, Cambridge, England, 2003.
17. M. Ohring, Materials Science of Thin Films: Deposition and Structure, 2nd ed., pp. 723-730, Academic Press, San Diego, 2002.
18. J. A. Floro, E. Chason, R. C. Cammarata, and D. J. Srolovitz, "Mecanical properties in small dimensions - Physical origins of intrinsic stresses in Volmer-Weber thin films," MRS Bull. 27(1), 19-25 (2002).
19. A. V. Tikhonravov, M. K. Trubetskov, A. A. Tikhonravov, and A. Duparre, "Effects of interface roughness on the spectral properties of thin films and multilayers," Appl. Opt. 42(25), 5140-5148 (2003).
20. B. A. Movchan and A. V. Demchishin, "Structure and properties of thick vacuum-condensates of nickel, titanium, tungsten, aluminum oxide, and zirconium dioxide," Fiz. Met. Metalloved 28(4), 653-660 (1969).
21. J. V. Sanders, "Structure of evaporated metal films," in Chemisorption and Reactions on Metallic Films, edited by J. R. Anderson, Physical Chemistry, A Series of Monographs, pp. 1-38, Academic Press, London, 1971.
22. J. A. Thorton, "Structure-zone models of thin films," in Modeling of Optical Thin Films, edited by M. R. Jacobson, Vol. 821, pp. 95-103, SPIE, Bellingham, WA, 1988.
23. S. Papernov and A. W. Schmid, "Localized absorption effects during 351 nm, pulsed laser irradiation of dielectric multilayer thin films," J. Appl. Phys. 82(11), 5422-5432 (1997).
24. A. V. Tikhonravov and M. K. Trubetskov, OptiLayer Thin Film Software, Optilayer Ltd., http://www.optilayer.com (9 June 2005).
25. B. D. Cullity, Elements of X-Ray Diffraction, 2nd ed., Addison-Wesley, Reading, MA, 1978.
26. PANalytical, Inc., Westborough, MA 01581 (see http://www.panalytical.com) .