Substrate Heating Using Several Configurations of an End-Hall Ion Source

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2003, Pages 621-625

  Kahn, J R ^a   Kaufman, H R ^a   Zhurin, V V ^a  

^a Kaufman and Robinson Inc   (United States)

Author keywords

Ion beam assisted deposition; Ion source; Substrate temperature; Thermal modeling

Indexed keywords

CATHODES; COOLING; FIBER OPTICS; HEATING; ION BEAM ASSISTED DEPOSITION;

TEMPERATURE SENSITIVE SUBSTRATES;

ION BOMBARDMENT;

EID: 0242384950     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

1. H.R. Kaufman, R.S. Robinson, and R.I. Seddon, "End-Hall Ion Source," J. Vac Sci Technol, A5 (4), 2081, 1987.
2. H.R. Kaufman and R.S. Robinson, U.S. Pat. 4,862,032, "End-Hall Ion Source," Aug 29, 1989.
3. Veeco Instruments Inc., Mark II End-Hall ion source. (Originally marketed by Commonwealth Scientific Corporation.)
4. Kaufman & Robinson, Inc., EH1000 End-Hall ion source.
5. H.R. Kaufman, Patent application, "Modular Gridless Ion Source," 2002.
6. H.R. Kaufman and R.S. Robinson, Operation of Broad-Beam Sources, p. 162, Commonwealth Scientific Corporation, Alexandria, Virginia, 1984.
7. R.S. Robinson, "Energetic Binary Collisions in Rare Gas Plasmas," J Vac Sci Technol, 16 (2), 185, 1979.