Growth and properties of transparent p-NiO/n-ITO (In2O 3:Sn) p-n junction thin film diode

Thin Solid Films

Volumn 519, Issue 11, 2011, Pages 3840-3843

  Mistry, B V ^a   Bhatt, P ^b   Bhavsar, K H ^a   Trivedi, S J ^a   Trivedi, U N ^b   Joshi, U S ^a  

^a GUJARAT UNIVERSITY   (India)

^b Government Engineering College   (India)

Author keywords

Chemical solution deposition; Current voltage characteristics; p n junction; Transparent conducting oxide

Indexed keywords

CARRIER DIFFUSIONS; CHEMICAL SOLUTION DEPOSITION; E BEAM EVAPORATION; FILM NANOSTRUCTURES; FORWARD BIAS; GRAZING INCIDENCE X-RAY DIFFRACTION; HETEROEPITAXIAL; JUNCTION INTERFACES; OPTICAL AND ELECTRICAL PROPERTIES; OPTICAL TRANSPARENCY; P-N JUNCTION; REVERSE BIAS; REVERSE LEAKAGE CURRENT; SN-DOPED; THIN FILM DIODE; TRANSFER RESISTANCE; TRANSPARENT CONDUCTING OXIDE;

ATOMIC FORCE MICROSCOPY; BIAS VOLTAGE; CHEMICALS; DEPOSITION; DISTILLATION; ELECTRIC PROPERTIES; EPITAXIAL GROWTH; SEMICONDUCTOR JUNCTIONS; SILICON COMPOUNDS; THIN FILMS; TIN; VAPOR DEPOSITION; X RAY DIFFRACTION;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 79952738343     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.01.255     Document Type: Article

References (27)

1. H. Hosono Thin Solid Films 515 2007 6000
2. H. Ohta, and H. Hosono Mater. Today 7 2004 42
3. E. Fortunato, P. Barquinha, A. Pimentel, A. Gonçalves, A. Marques, L. Pereira, and R. Martins Adv. Mater. 17 2005 590
4. A.J. Freeman, K.R. Poeppelmeier, T.O. Mason, R.P.H. Chang, and T.J. Marks MRS Bull. 2000 45
5. J.F. Wager Science 300 2003 1245
6. D.S. Ginley, and C. Bright MRS Bull. 25 2000 15
7. B.J. Lewis, and D.C. Paine MRS Bull. 25 2000 22
8. K. Omura, P. Veluchamy, M. Tsuji, T. Nishio, and D. Murojono J. Electrochem. Soc. 146 1999 2113
9. B. Orel, U. Lavrencic-Stangar, and K. Kalcher J. Electrochem. Soc. 141 1994 L127
10. S.J. Laverty, H. Feng, and P. Maguire J. Electrochem. Soc. 144 1997 2165
11. Z. Hamberg, J.S.E.M. Svesson, T.S. Eriksson, C.G. Granqvist, P. Arrenius, and F. Narin Appl. Opt. 26 1987 2131
12. A.V. Tadeev, G. Delabouglise, and M. Labeau Mater. Sci. Eng. B 57 1998 76
13. G. Phatak, and R. Lal Thin Solid Films 245 1994 17
14. K.L. Chopra, S. Major, and D.K. Pandya Thin Solid Films 102 1983 1
15. S. Pizzini, N. Butta, D. Narducci, and M. Palladino J. Electrochem. Soc. 136 1989 1945
16. D.M. Mattox Thin Solid Films 204 1991 25
17. H. Gong, and Y. Wang Luo Yi Appl. Phys. Lett. 76 2000 3959
18. H. Hidenori, O. Masahiro, M. Hirano, K. Ueda, and H. Hosono J. Appl. Phys. 91 2002 9177
19. H. Ohta, M. Orita, M. Hirano, I. Yagi, K. Ueda, and H. Hosono J. Appl. Phys. 91 2002 3074
20. F. Zhuge, L.P. Zhu, Z.Z. Ye, D.W. Ma, J.G. Lu, J.Y. Huang, F.Z. Wang, Z.G. Ji, and S.B. Zhang Appl. Phys. Lett. 87 2005 092103
21. U.S. Joshi, Y. Matsumoto, K. Itaka, M. Sumiya, and H. Koinuma Appl. Surf. Sci. 252 7 2006 2524
22. U.S. Joshi, S.J. Trivedi, K.H. Bhavsar, U.N. Trivedi, S.A. Khan, and D.K. Avasthi J. Appl. Phys. 105 2009 73704
23. U.S. Joshi, R. Takahashi, Y. Matsumotu, and H. Koinuma Thin Solid Films 486 2005 214
24. H.A. Mohamed, and H.M. Ali Sci. Technol. Adv. Mater. 9 2008 025016
25. W.S. Cheong, S.M. Yoon, Hwang, and H.Y. Chu Jpn. J. Appl. Phys. 48 2009 04C090
26. R.K. Gupta, K. Ghosh, R. Patel, and P.K. Kahola Mater. Sci. Eng. B 156 2009 1
27. K. Tonooka, H. Bando, and Y. Aiura Thin Solid Films 445 2003 327