Structure of NiO and Li-doped NiO single crystalline thin layers with atomically flat surface

Thin Solid Films

Volumn 486, Issue 1-2, 2005, Pages 214-217

  Joshi, U S ^a   Takahashi, R ^a   Matsumoto, Y ^a   Koinuma, H ^a,b,c  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Oxides; Pulsed laser deposition; Solid phase epitaxy; Surface morphology

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM GROWTH; MORPHOLOGY; NICKEL COMPOUNDS; OXIDES; PULSED LASER DEPOSITION; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SINGLE CRYSTALS;

ANATOMICALLY FLAT SURFACE; ANNEALING TEMPERATURES; ROOM TEMPERATURE; SOLID PHASE EPITAXY;

THIN FILMS;

EID: 22044453074     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.219     Document Type: Conference Paper

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