Glancing angle deposition of crystalline zinc oxide nanorods

Thin Solid Films

Volumn 519, Issue 11, 2011, Pages 3530-3537

  LaForge, Joshua M ^a   Taschuk, Michael T ^a   Brett, Michael J ^a,b  

^a UNIVERSITY OF ALBERTA   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

Crystal; Kinetics; Morphology; Nanorod; Nanostructure; Sputtering; Thin film; Zinc oxide

Indexed keywords

CRYSTALLINE GROWTH; CRYSTALLINITIES; FIGURE MEASUREMENT; FILM MORPHOLOGY; GLANCING ANGLE DEPOSITION; GROWTH REGIME; NANOROD GROWTH; NANOSTRUCTURED FILMS; OPTIMAL GROWTH; PARAMETER SPACES; PITCH VALUES; PROCESS VARIABLES; SINGLE-CRYSTAL NANORODS; STATISTICAL ANALYSIS; SUBSTRATE ROTATION; ZINC OXIDE NANORODS;

CRYSTALLINE MATERIALS; DEPOSITION RATES; FILM GROWTH; GROWTH KINETICS; MORPHOLOGY; NANORODS; THIN FILMS; VAPOR DEPOSITION; ZINC; ZINC OXIDE;

OXIDE FILMS;

EID: 79952736317     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.01.241     Document Type: Article

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