Strong surface diffusion mediated glancing-angle deposition: Growth, recrystallization and reorientation of tin nanorods

Chinese Physics Letters

Volumn 25, Issue 1, 2008, Pages 234-237

  Wang, Huan Hua ^a   Shi, Yi Jian ^b   Chu, William ^b   Blum, Yigal ^b  

^a INSTITUTE OF HIGH ENERGY PHYSICS   (China)

^b SRI INTERNATIONAL   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FILM GROWTH; RECRYSTALLIZATION (METALLURGY); SINGLE CRYSTALS; SUBSTRATES; SURFACE DIFFUSION; THERMAL EVAPORATION; TIN; TITANIUM NITRIDE;

GLANCING ANGLE DEPOSITION; GLASS SUBSTRATES; HIGHEST TEMPERATURE; MONOCRYSTALLINE; NANOROD FILMS; PREFERRED ORIENTATIONS; RECRYSTALLISATION; SILICON SUBSTRATES; SUBSTRATE SURFACE;

NANORODS;

EID: 41849091541     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/25/1/064     Document Type: Article

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