Superhydrophobic and low light reflectivity silicon surfaces fabricated by hierarchical etching

Langmuir

Volumn 24, Issue 18, 2008, Pages 10421-10426

  Xiu, Yonghao ^a   Zhang, Shu ^a   Yelundur, Vijay ^b   Rohatgi, Ajeet ^b   Hess, Dennis W ^a   Wong, C P ^a  

^a Georgia Institute of Technology   (United States)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT ANGLE HYSTERESIS; CONTACT ANGLES; ETCHED SURFACES; LAPLACE PRESSURES; LIGHT REFLECTIVITY; OPTICAL DEVICES; PHOTOVOLTAIC DEVICES; PHOTOVOLTAICS; SILICON SURFACES; SUPER-HYDROPHOBIC; SUPER-HYDROPHOBIC SURFACES; SURFACE INTERFACES;

CONTACT ANGLE; ELASTICITY; ELECTRONICS INDUSTRY; ETCHING; HYDROPHOBICITY; HYSTERESIS; INTEGRATED CIRCUITS; NONMETALS; OPTICAL DESIGN; OPTICAL INSTRUMENTS; OPTICAL SENSORS; PHOTOVOLTAIC EFFECTS; REFLECTION; SILICON; SILICON DETECTORS;

SURFACE PROPERTIES;

EID: 52649111631     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la801206m     Document Type: Article

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