Black luminescent silicon

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 8, Issue 3, 2011, Pages 1021-1026

  Pezoldt, Jörg ^a   Kups, Thomas ^a   Stubenrauch, Mike ^a   Fischer, Michael ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Black silicon; Cathodoluminescence; Dry etching; Quantum confinement; Quantum wire

Indexed keywords

BLACK SILICON; BULK SILICON; DIFFUSE REFLECTIVITY; FLUORINE-DOPED; HIGH DENSITY; NANO-SIZED; NONSTOICHIOMETRIC; QUANTUM WIRE; SELF ORGANIZED STRUCTURES; SILICON DIOXIDE; SILICON NANOSTRUCTURES; VISIBLE SPECTRA;

CATHODOLUMINESCENCE; FLUORINE; NANOWIRES; PLASMA ETCHING; QUANTUM CONFINEMENT; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR QUANTUM WIRES; SILICA; SILICON WAFERS; WIRE;

DRY ETCHING;

EID: 79952688116     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.201000388     Document Type: Article

References (48)

1. S. Ossicini, L. Pavesi, and F. Priolo, Light Emitting Silicon for Microphotonics (Springer, Berlin, 2003), p. 282.
2. H. Wong, V. Filip, C. K. Wong, and P. S. Chung, Microelectron. Reliab. 47, 1 (2007).
3. L. T. Canham, Appl. Phys. Lett. 57, 1046 (1990).
4. F. Koch and V. Petrova-Koch, J. Non-Cryst. Solids 198-200, 840 (1996).
5. P. M. Fauchet, Materials Today 8(1), 27 (2005).
6. V. Kochergin and H. Foell, Mater. Sci. Eng. R 52, 93 (2006).
7. L. Rebohle, J. von Borany, D. Borchert, H. Fröb, T. Gebel, M. Helm, W. Möller, and W. Skorupa, Electrochem. Sol. State Sci. Lett. 7, G57 (2001).
8. L. Rebohle, C. Cherkouk, S. Prucnal, M. Helm, and W. Skorupa, Vacuum 83, S24 (2009).
9. L. Rebohle, J. von Borany, H. Fröb, and W. Skorupa, Appl. Phys. B 71, 131 (2000).
10. M. Gotza, M. Dutoit, and M. Ilgems, J. Vac. Sci. Technol. B 16, 582 (1998).
11. A. Wellner, R. E. Palmer, J. G. Zheng, C. J. Kiely, and K. W. Kolasinski, J. Appl. Phys. 91, 3294 (2002).
12. C. Wu, C. H. Crouch, L. Zhao, and E. Mazur, Appl. Phys. Lett. 81, 1999 (2002).
13. A. Serpengüzül, A. Kurt, I. Inanc, J. E. Cary, and E. Mazur, J. Nanophotonics 2, 021770 (2008).
14. H. Jansen, M. de Boer, R. Legtenberg, and M. Elwenspoek, J. Micromech. Microeng. 5, 115 (1995).
15. T. P. Chow, P. A. Maciel, and G. M. Fanelli, J. Electrochem. Soc. 134, 1282 (1987).
16. R. Dussart, X. Mellhaoui, T. Tillocher, P. Lefaucheux, M. Volatier, C. Socquet-Clerc, P. Brault, and R. Ranson, J. Phys. D, Appl. Phys. 38, 3395 (2005).
17. G. Kumaralevu, M. M. Alkaisi, A. Bittar, D. Macdonald, and J. Zhao, Curr. Appl. Phys. 4, 108 (2004).
18. M. Stubenrauch, M. Fischer, C. Kremin, S. Stoebenau, A. Albrecht, and O. Nagel, J. Micromech. Microeng. 16, S82 (2006).
19. K. B. Jung, W. J. Song, H. W. Lim, and C. S. Lee, J. Vac. Sci. Technol. B 28, 143 (2010).
20. M. Ghargi and S. Sivoththaman, J. Vac. Sci. Technol A 24, 723 (2006).
21. T.-H. Her, R. J. Finlay, C. Wu, S. Deliwala, and E. Mazur, Appl. Phys. Lett. 73, 1673 (1998).
22. C. Wu, C. H. Crouch, L. Zhao, J. E. Carey, R. Younkin, J. A. Levinson, E. Mazur, R. M. Farrell, P. Gothoshkar, and A Karger, Appl. Phys. Lett. 78, 1850 (2001).
23. S. Koynov, M. S. Brandt, and M. Stutzmann, Appl. Phys. Lett. 88, 203107 (2006).
24. H.-C. Yuan, V. E. Yost, M. R. Page, P. Stradis, D. L. Meier, and H. M. Branz, Appl. Phys. Lett. 95, 123501 (2009).
25. L. L. Ma, Y. C. Zhou, N. Jiang, X. Lu, J. Shao, W. Lu, J. Ge, X. M. Ding, and X. Y. Hou Appl. Phys. Lett. 88, 171907 (2006).
26. V. Torre-Cost,F. Paszti, A. Climent-Font, R. J. Martin-Palma, and J. M. Martinez-Duart, J. Electrochem. Soc. 152, G846 (2005).
27. L. L. Ma, Y. C. Zhou, N. Jiang, X. Lu, J. Shao, and W. Lu, Appl. Phys. Lett. 88, 171907 (2006).
28. V. Lebedev, F. M. Morales, M. Fischer, M. Himmerlich, S. Krischok, J. A. Schäfer, and O. Ambacher, Phys. Status Solidi A 203, 1839 (2006).
29. C.-H. Choi and C. J. Kim, Phys. Rev. Lett. 96, 066001 (2006).
30. F. L. Wong, M. K. Fung, X. Jiang, C. S. Lee, and S. T. Lee, Thin Solid Films 446, 143 (2004).
31. Z. Huang, J. E. Crey, M. Liu, X. Guo, E. Mazur, and J. C. Campbell, Appl. Phys. Lett. 89, 033506 (2006).
32. S. Turner, L. Kam, M. Isaacson, H. G. Craighead, W. Shain, and J. Turner, J. Vac. Sci. Technol. B 15, 2848 (1997).
33. V. Cimalla, M. Stubenrauch, F. Weise, M. Fischer, K. Tonisch, M. Hoffmann, and O. Ambacher, Appl. Phys. Lett. 90, 101504 (2007).
34. M. Fischer, H. Bartsch de Torres, B. Pawlowski, R. Gade, S. Barth, M. Mach, M. Stubenrauch, M. Hoffmann, and J. Müller, J. Microelectr. Electr. Pack. 6, 1 (2009).
35. M. Stubenrauch, M. Fischer, C. Kremin, M. Hoffmann, and J. Müller, Micro Nano Lett. 2, 6 (2007).
36. R. B. Stephens, G. D. Cody, Thin Solid Films 45, 19 (1977).
37. H. Sai, Y. Kanamori, K. Arafune, Y. Ohshita, and M. Yamaguchi, Prog. Photovolt. Res. Appl. 15, 415 (2007).
38. L. Brus, J. Phys. Chem. 90, 2555 (1986).
39. C. Delerue, G. Allan, and M. Lannoo, Phys. Rev. B 48, 5726 (1988).
40. G. D. Sanders and Y.-C. Chang, Appl. Phys. Lett. 60, 2527 (1992).
41. F. Yonezawa, K. Nishio, J. Koga, and T. Yamaguchi, J. Electroanal. Chem. 559, 13 (2003).
42. M. Wolkin, J. Jorne, P. M. Fauchet, G. Allan, and C. Delerue, Phys. Rev. Lett. 82, 197 (1999).
43. G. Beloin, J. Therrien, A. Smith, S. Rao, R. Twesten, S. Chaieb, M. H. Nayfeh, L. Wagner, and L. Mitas, Appl. Phys. Lett. 80, 841 (2002).
44. M. Fischer, M. Stubenrauch, Th. Kups, H. Romanus, F. M. Morales, G. Ecke, M. Hoffmann, C. Knedlik, O. Ambacher, and J. Pezoldt, in: Proc. of the 51. Internat. Wiss. Kolloquium TU Ilmenau, Ilmeanu, Germany, 2006 (TU Ilmenau, Ilmenau, 2006), pp. 4-2-5-1 - 4-2-5-9.
45. H. Nishikava, T. Shiroyama, R. Nakamura, Y. Ohki, K. Nagasawa, and Y. Hama, Phys. Rev. B 45, 586 (1992).
46. M. L.-S. Liao, X.-M. Bao, N.-N. Li, X.-Q. Zheng, and N. B. Min, J. Lumin. 68, 199 (1996).
47. M. Götze, M. Dutoit, and M. Ilegems, J. Vac. Sci. Technol. B 16, 582 (1998).
48. M. V. Zamorskaya, V. I. Sokholov, and V. Plotnikov, Appl. Surf. Sci. 234, 214 (2004).