Expanded beam (macro-imaging) ellipsometry

Thin Solid Films

Volumn 519, Issue 9, 2011, Pages 2730-2736

  Fried, M ^a   Juhasz G ^a   Major, C ^a   Petrik, P ^a   Polgar O ^a   Horvath Z ^b   Nutsch, A ^c  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^b WIGNER RESEARCH CENTRE FOR PHYSICS   (Hungary)

^c FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

Author keywords

Ellipsometry; Mapping; Thin film

Indexed keywords

2D IMAGES; ANGLE-OF-INCIDENCE; CAMERA DETECTORS; DETECTOR SYSTEMS; EXPANDED BEAMS; FOCAL LENGTHS; FULL SPECTRUM; IMAGING ELLIPSOMETRY; IMAGING PARAMETERS; LARGE-AREA SOLAR CELLS; LATERAL RESOLUTION; LIGHT INTENSITY; MEASURING SYSTEMS; NANOMETER THICKNESS; OPTIMIZED STRUCTURES; POLARIZATION STATE; POLARIZATION-STATE GENERATORS; PRODUCTION LINE; RAPID MEASUREMENT; REFRACTIVE INDEX CHANGES; ROTATION PERIOD; SAMPLE POINT; SAMPLE SURFACE; SCATTERED LIGHT; UPSCALING; VACUUM CHAMBERS;

DETECTORS; FILM PREPARATION; LIGHT REFRACTION; MAPPING; MAPS; OPTICAL INSTRUMENTS; OPTIMIZATION; POLARIZATION; REFRACTIVE INDEX; REFRACTOMETERS; SECURITY OF DATA; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS;

PINHOLE CAMERAS;

EID: 79952625151     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.12.067     Document Type: Article

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