Wide angle beam ellipsometry for extremely large samples

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 5, Issue 5, 2008, Pages 1077-1080

  Major, C ^a   Juhasz G ^a   Horvath Z ^b   Polgar, O ^a   Fried, M ^a  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^b WIGNER RESEARCH CENTRE FOR PHYSICS   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE BEAM; ANGLE-OF-INCIDENCE; CONTROL PURPOSE; IN-VACUUM; LATERAL RESOLUTION; POLARIZATION STATE; PRODUCTION LINE; SAMPLE SURFACE; WIDE ANGLE;

LIGHT SOURCES; MAPS; REFRACTIVE INDEX;

SPECTROSCOPIC ELLIPSOMETRY;

EID: 77951128485     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200777859     Document Type: Conference Paper

References (6)

1. Patent pending: P0700366, 2007
2. M. Fried, Z. Horváth, G. Juhász, T. Mosoni, and P. Petrik, Divergent Illumination Optical Testing Device; Proc. 13rd Advanced Equipment Control/Advanced Process Control Conference, October 6-11, 2001, Banff, Canada, poster.
3. M. Fried, Z. Horváth, G. Juhász, O. Polgár, T. Mosoni, and P. Petrik; Divergent Illumination Optical Testing Device, Proc. 3rd European Advanced Equipment Control/Advanced Process Control Conference, April 10-12, 2002, Dresden, Germany, poster
4. G. Juhász, P. Petrik, O. Polgár, and M. Fried, Homogeneity check of ion implantation in silicon by wide-angle ellipsometry, 4th Workshop Ellipsometry, 20-22 February (2006), Berlin, Germany, poster.
5. G. Jin, R. Jansson, and H. Arwin, Rev. Sci. Instrum. 67(8), 2930 (1996).
6. D. J. Wentink, PhD, Twente University, 1996.