Non-destructive characterization of strontium bismuth tantalate films

Materials Science in Semiconductor Processing

Volumn 5, Issue 2-3, 2002, Pages 141-145

  Petrik, P ^a   Khanh N Q ^a   Horvath Z E ^a   Zolnai, Z ^a   Barsony I ^a   Lohner, T ^a   Fried, M ^a   Gyulai, J ^a   Schmidt, C ^b   Schneider, C ^b   Ryssel, H ^b,c  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^b FRAUNHOFER INSTITUTE FOR INTEGRATED CIRCUITS IIS   (Germany)

^c UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Metal organic chemical vapor deposition; Rutherford backscattering spectroscopy; Spectroscopic ellipsometry; Strontium bismuth tantalate; X ray diffraction

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GRAIN SIZE AND SHAPE; NONDESTRUCTIVE EXAMINATION; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STRONTIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

LIQUID METAL-ORGANIC PRECURSORS;

THIN FILMS;

EID: 0036557724     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(02)00095-1     Document Type: Conference Paper

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