Non-collimated beam ellipsometry

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 5, Issue 5, 2008, Pages 1081-1084

  Juhasz G ^a   Horvath Z ^b   Major, C ^a   Petrik, P ^a   Polgar O ^a   Fried, M ^a  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^b WIGNER RESEARCH CENTRE FOR PHYSICS   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE-OF-INCIDENCE; COLLIMATED BEAMS; ELLIPSOMETERS; FILM POLARIZER; LATERAL RESOLUTION; LAYER STRUCTURES; MATRIX; MEASURING SYSTEMS; OPTICAL ARRANGEMENT; POLARIZATION STATE; POROUS SILICON LAYERS; PRODUCTION LINE; RAPID MEASUREMENT; REFLECTOMETRY; SILICON DIOXIDE; SUBNANOMETERS;

ION IMPLANTATION; MAPPING; MAPS; POLARIZATION; REFRACTIVE INDEX; SLIP FORMING; SPECTROSCOPIC ELLIPSOMETRY;

POROUS SILICON;

EID: 66349111992     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200777862     Document Type: Conference Paper

References (6)

1. Gang Jin, R. Jansson, and H. Arwin, Rev. Sci. Instrum. 67, 2930 (1996).
2. Patent pending, P0700366 (2007).
3. rd Advanced Equipment Control/Advanced Process Control Conference, Banff, Canada, October 6-11, 2001, poster;
4. M. Fried, Z. Horváth, G. Juhász, O. Polgár, T. Mosoni, and P. Petrik, Divergent Illumination Optical Testing Device; Proc. of 3rd European Advanced Equipment Control/Advanced Process Control Conference, Dresden, Germany, April 10-12, 2002, poster.
5. G. Juhász, P. Petrik, O. Polgár, and M. Fried, Homogeneity check of ion implantation in silicon by wide-angle ellipsometry, in: 4th Workshop Ellipsometry, Berlin, Germany, February 20-22, 2006, poster.
6. T. Lohner, N. Q. Khanh, and Zs. Zolnai, Acta Phys. Slovaca 48, 441 (1998).