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Applied Surface Science

Volumn 256, Issue 14, 2010, Pages 4601-4605

Oxygen influence on sputtered high rate ZnO:Al films from dual rotatable ceramic targets

(4) Zhu, H a,b Hupkes J b Bunte, E b Huang, S M a

a East China Normal University (China)

b FORSCHUNGSZENTRUM JÜLICH (Germany)

Author keywords

Ceramic targets; Sputtering; Surface structures; ZnO:Al films

Indexed keywords

ALUMINUM OXIDE; CARRIER CONCENTRATION; CERAMIC MATERIALS; CHLORINE COMPOUNDS; FLOW OF GASES; GRAIN BOUNDARIES; II-VI SEMICONDUCTORS; ION BOMBARDMENT; LIGHT ABSORPTION; LIGHT SCATTERING; LIGHT TRANSMISSION; METALLIC FILMS; OPTICAL FILMS; OXYGEN; SPUTTERING; SURFACE STRUCTURE; TRANSPARENT CONDUCTING OXIDES; ZINC OXIDE;

ALUMINUM DOPED ZINC OXIDE FILMS; CERAMIC TARGET; CHEMICAL WET ETCHING; DISCHARGE POWER; ENERGETIC OXYGEN IONS; INFLUENCE OF OXYGEN; OXYGEN INFLUENCE; ZNO:AL FILMS;

FILM PREPARATION;

EID: 77950690734 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2010.02.057 Document Type: Article

Times cited : (36)

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