In situ measurement of mechanical stress in polycrystalline zinc-oxide thin films prepared by magnetron sputtering

Journal of Applied Physics

Volumn 88, Issue 5, 2000, Pages 2443-2450

  Hinze, J ^a   Ellmer, K ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM OXIDE; ARGON; COMPRESSIVE STRESS; CRYSTALLINITY; FILM PREPARATION; II-VI SEMICONDUCTORS; MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL FILMS; OXYGEN; STRESS MEASUREMENT; TRANSPARENT CONDUCTING OXIDES; ZINC OXIDE;

ALUMINUM DOPED ZINC OXIDES (ZNO:AL); DEPOSITION PARAMETERS; IN-SITU STRESS MEASUREMENT; MECHANICAL AND ELECTRICAL PROPERTIES; OXYGEN PARTIAL PRESSURE; POLYCRYSTALLINE ZINC OXIDES; RADIO FREQUENCY MAGNETRON SPUTTERING; SPUTTERING PRESSURES;

THIN FILMS;

EID: 0000902940     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1288162     Document Type: Article

References (44)

1. H. L. Hartnagel, A. L. Dawar, A. K. Jain, and C. Jagadish, Semiconducting Transparent Thin Films (IOP, Bristol, 1995), p. 1.
2. K. Ellmer, J. Phys. D: Appl. Phys. 33, R17 (2000).
3. C. Ohler, A. Förster, J. Moers, C. Daniels, and H. Lüth, J. Phys. D: Appl. Phys. 30, 1436 (1997).
4. K. Ellmer, R. Cebulla, and R. Wendt, Proceedings of the MRS Spring Meeting, San Francisco, California, March 31-April 4 (MRS, Pittsburgh, PA, 1997), p. 245.
5. C. Eberspacher, A. L. Fahrenbruch, and R. H. Bube, Thin Solid Films 136, 1 (1986).
6. J. Hu and R. G. Gordon, Sol. Cells 30, 437 (1991).
7. J. Hu and R. G. Gordon, Mater. Res. Soc. Symp. Proc. 242, 743 (1992).
8. L. Russell, B. Fieselmann, and R. R. Arya, Proceedings of the 23rd IEEE Photovoltaic Specialists Conference, Louisville, Kentucky, 10-14 May (IEEE, Piscataway, NJ, 1993), p. 581.
9. R. Menner, B. Dimmler, R. H. Mauch, and H. W. Schock, J. Cryst. Growth 86, 906 (1988).
10. Z.-C. Jin, I. Hamberg, and C. G. Granqvist, J. Appl. Phys. 64, 5117 (1988).
11. R. H. Mauch and H. W. Schock, Proceedings of the 10th European Photovoltaic Solar Energy Conference, Lisbon, Portugal (Kluwer, Dordrecht, 1991), p. 88.
12. G. L. Harding, B. Window, and E. C. Horrigan, Sol. Energy Mater. 22, 69 (1991).
13. T. Minami, H. Sato, T. Sonoda, H. Nanto, and S. Takata, Thin Solid Films 171, 307 (1989).
14. T. Minami, K. Oohashi, S. Takata, T. Mouri, and N. Ogawa, Thin Solid Films 193/194, 721 (1990).
15. T. Minami, H. Sato, H. Imamoto, and S. Takata, Jpn. J. Appl. Phys. 31, L257 (1992).
16. A. Kuroyanagi, J. Appl. Phys. 66, 5492 (1989).
17. S. Maniv, W. D. Westwood, and E. Colombini, J. Vac. Sci. Technol. 20, 162 (1982).
18. D. W. Hoffman and J. A. Thornton, J. Vac. Sci. Technol. 17, 380 (1980).
19. J.-H. Jou, M.-Y. Han, and D.-J. Cheng, J. Appl. Phys. 71, 4333 (1992).
20. R. Cebulla, R. Wendt, and K. Ellmer, J. Appl. Phys. 83, 1087 (1998).
21. R. Koch, J. Phys.: Condens. Matter 6, 9519 (1994).
22. M. Ohring, The Materials Science of Thin Films (Academic, Boston, MA, 1992), p. 197.
23. D. S. Campbell, in Handbook of Thin Film Technology, edited by L. I. Maissel and R. Glang (McGraw-Hill, New York, 1970), p. 12.
24. R. W. Hoffman, in Physics of Nonmetallic Thin Films, edited by C. H. S. Dupuy and A. Cachard (Plenum, New York, 1976), p. 273.
25. M. F. Doerner and W. D. Nix, CRC Crit. Rev. Solid State Mater. Sci. 14, 225 (1988).
26. K. Koski, J. Hölsa, and P. Juliet, Thin Solid Films 339, 240 (1999).
27. R. Koch, H. Leonhard, and R. Abermann, Thin Solid Films 89, 117 (1982).
28. G. G. Stoney, Proc. R. Soc. London, Ser. A 82, 172 (1909).
29. A. Brenner and S. Senderoff, J. Res. Natl. Bur. Stand. 42, 105 (1949).
30. K. Ellmer, K. Diesner, R. Wendt, and S. Rechter, in Polycrystalline Semiconductors IV - Physics, Chemistry and Technology, edited by S. Pizzini, H. P. Strunk, and J H. Werner (Trans Tech, Zug, Switzerland, 1995), p. 541.
31. H. P. Klug and L. E. Alexander, X-Ray Diffraction Procedures for Polycrystalline and Amorphous Materials (Wiley, New York, 1974), p. 687.
32. E. Mollwo, in Zahlenwerte und Funktionen aus Naturwiss. u. Technik. Neue Serie, Landoldt-Börnstein, edited by O. Madelung, M. Schulz, and H. Weiss (Springer, Berlin, 1982), p. 35.
33. J. A. Thornton and D. W. Hoffman, J. Vac. Sci. Technol. A 3, 576 (1985).
34. J. A. Thornton and D. W. Hoffman, Thin Solid Films 171, 5 (1989).
35. M. Janda and O. Stefan, Thin Solid Films 112, 127 (1984).
36. F. M. d'Heurle and J. M. E. Harper, Thin Solid Films 171, 81 (1989).
37. H. Windischmann, J. Appl. Phys. 62, 1800 (1987).
38. K. O. Schweitz, J. Arndt, J. Bottiger, and J. Chevallier, Nucl. Instrum. Methods Phys. Res. B 127/128, 809 (1997).
39. K. Ellmer and R. Mientus, Surf. Coat. Technol. 116-119, 1102 (1999).
40. I. Sieber, N. Wanderka, I. Urban, I. Dörfel, E. Schierhorn, F. Fenske, and W. Fuhs, Thin Solid Films 330, 108 (1998).
41. H. J. Osten, E. Bugiel, and J. Klatt, Appl. Phys. Lett. 61, 1918 (1992).
42. T. J. Vink, W. Walrave, J. L. C. Daams, P. C. Baarslag, and J. E. A. M. van den Meerakker, Thin Solid Films 266, 145 (1995).
43. Y.-S. Kim and S.-C. Shin, J. Magn. Magn. Mater. 198-199, 602 (1999).
44. L. Hultman, J.-E. Sundgren, D. B. Bergstrom, and I. Petrov, J. Appl. Phys. 78, 5395 (1995).