Bidirectional control of silicon's surface potential by means of molecular coverage

Journal of Physical Chemistry C

Volumn 114, Issue 43, 2010, Pages 18674-18678

  Puniredd, Sreenivasa Reddy ^a   Platzman, Ilia ^a   Tung, Raymond T ^b   Haick, Hossam ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b CITY UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MONOLAYER COVERAGE; SI (1 1 1); SI SURFACES;

CHEMICAL STABILITY; FUNCTIONAL GROUPS; MONOLAYERS; SURFACE POTENTIAL; SURFACE PROPERTIES;

SILICON;

EID: 78650316548     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp107806z     Document Type: Article

References (19)

1. Vilan, A.; Yaffe, O.; Biller, A.; Salomon, A.; Kahn, A.; Cahen, D. Adv. Mater. 2010, 22, 140-159.
2. Magid, I.; Burstein, L.; Seitz, O.; Segev, L.; Kronik, L. Y. R. J. Phys. Chem. C 2008, 112, 7145-7150.
3. Hiremath, R. K.; Rabinal, M. K.; Mulimani, B. G.; Khazi, I. M. Langmuir 2008, 24, 11300-11306.
4. Puniredd, S. R.; Assad, O.; Haick, H. J. Am. Chem. Soc. 2008, 130, 13727-13734.
5. Gozlan, N.; Haick, H. J. Phys. Chem. C 2008, 112, 12599-12601.
6. Natan, A.; Kronik, L.; Haick, H.; Tung, R. T. Adv. Mater. 2007, 19, 4103-4117.
7. He, T.; He, J.; Lu, M.; Chen, B.; Pang, H.; Reus, W. F.; Nolte, W. M.; Nackashi, D. P.; Franzon, P. D.; Tour, J. M. J. Am. Chem. Soc. 2006, 128, 14537-14541.
8. Bashouti, M. Y.; Tung, R. T.; Haick, H. Small 2009, 5, 2761-2769.
9. Paska, Y.; Haick, H. J. Phys. Chem. C 2009, 113, 1993-1997.
10. Puniredd, S. R.; Assad, O.; Haick, H. J. Am. Chem. Soc. 2008, 130, 9184-9185.
11. Wamser, C.; Scott, L. J. Chem. Educ. 1985, 62, 650-652.
12. Wide-scan XPS spectra for propenyl-terminated Si surfaces have not shown any residues of chlorine and/or bromine from the chlorination/alkylation process.
13. Basu, R.; Kinser, C.; Tovar, J.; Hersam, M. Chem. Phys. 2006, 326, 144-150.
14. Jin, H.; Kinser, C.; Bertin, P.; Kramer, D.; Libera, J.; Hersam, M.; Nguyen, S.; Bedzyk, M. Langmuir 2004, 20, 6252-6258.
15. Aradi, B.; Ramos, L. E.; Deak, P.; Ohler, T.; Bechstedt, F.; Zhang, R. Q.; Frauenheim, T. Phys. Rev. B 2007, 76, 035305/1-035305/7.
16. Haick, H.; Ambrico, M.; Ligonzo, T.; Tung, R. T.; Cahen, D. J. Am. Chem. Soc. 2006, 128, 6854-6869.
17. Ishida, H.; Terakura, K. Phys. Rev. B 1987, 36, 4510-4514.
18. MacDonald, J. R.; Barlow, C. A. J. J. Phys. Chem. 1964, 68 (10), 2737-40.
19. Topping, J. Proc. R. Soc. London, Ser. A 1927, 114, 67.