Flexible Al-doped ZnO films grown on PET substrates using linear facing target sputtering for flexible OLEDs

Journal of Physics D: Applied Physics

Volumn 43, Issue 46, 2010, Pages

  Jeong, Jin A ^a   Shin, Hyun Su ^a   Choi, Kwang Hyuk ^a   Kim, Han Ki ^a  

^a Kyung Hee University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AL-DOPED ZINC OXIDE FILMS; AL-DOPED ZNO; AZO FILMS; COST-EFFICIENT; DC POWER; ELECTRICAL , OPTICAL AND STRUCTURAL PROPERTIES; ENERGY PARTICLES; FACING TARGET SPUTTERING; FLEXIBLE ORGANIC LIGHT - EMITTING DIODES; HIGH DENSITY PLASMAS; INDIUM-FREE; LOW TEMPERATURES; PET SUBSTRATE; PLASMA DAMAGE; ROOM TEMPERATURE; SPUTTERING TECHNIQUES; SUBSTRATE HEATING; TRANSPARENT CONDUCTING ELECTRODES; VISIBLE RANGE;

ALUMINUM; CONDUCTIVE FILMS; DC POWER TRANSMISSION; DOPING (ADDITIVES); ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; ELECTRODES; FACINGS; LIGHT EMITTING DIODES; OPTICAL FILMS; ORGANIC LIGHT EMITTING DIODES (OLED); OXIDE FILMS; PLASMA DEPOSITION; PLASMAS; ZINC OXIDE;

SUBSTRATES;

EID: 78650113427     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/46/465403     Document Type: Article

References (21)

1. Duan L, Liu S, Zhang D, Qiao J, Dong G, Wang L and Qiu y 2009 J. Phys. D: Appl. Phys. 42 075103
2. Choi K H, Nam H J, Jeong J A, Cho S W, Kim H K, Kang J W, Kim D G and Cho W J 2008 Appl. Phys. Lett. 92 223302
3. Cho S W et al 2008 Thin Solid Films 516 7881
4. Jeong J A, Lee J y and Kim H K 2009 Electrochem. Solid-State Lett. 12 J105
5. Moon J M and Kim H K 2008 J. Electrochem. Soc. 155 J187
6. Kim H K, Lee K S, Keum M J and Kim H K 2005 Electrochem. Solid-State Lett. 8 H103
7. Kim H K, Kim S W, Lee K S and Kim K H 2006 Appl. Phys. Lett. 88 083513
8. Kim H K, Kim D G, Lee K S, Huh M S, Jeong S H, Kim K I and Seong T y 2005 Appl. Phys. Lett. 86 183503
9. Kim H K, Lee K S and Kang H A 2006 J. Electrochem. Soc. 153 H29
10. Swarnalatha M and Mohan S 1997 Vacuum 48 15
11. Nathan S S, Rao G M and Mohan S 1998 J. Appl. Phys. 84 564
12. Hoshi Y, Lato H O and Funatsu K 2003 Thin Solid Films 445 245
13. Li Z Q, Zhang D X and Lin J J 2006 J. Appl. Phys. 99 124906
14. Suchea M, Christoulakis S, Katsarakis N, Kitsopoulos T and Kiriakidis G 2007 Thin Solid Films 515 6562
15. Sato Y, Yanagisawa K and Oka N 2009 J. Vac. Sci. Technol. A 27 1166
16. Park H J, Park J W, Jeong S y and Ha C S 2005 Proc. IEEE 93 1447
17. Naoe M, Matsushita N and Nakagawa S 1991 J. Appl. Phys. 70 6489
18. Matsuoka M, Hoshi y and Naoe M 1988 J. Appl. Phys. 63 2098
19. Bae J H, Moon J M, Jeong S W, Kim J J, Kang J W, Kim D G, Kim J K, Park J W and Kim H K 2008 J. Electrochem. Soc. 155 J1
20. Kim H, Gilmore C M, Horwitz J S, Piqué A, Murata H, Kushto P, Schlaf R, Kafafi Z H and Chrisey D B 2000 Appl. Phys. Lett. 76 259
21. Jiang X, Wong F L, Fung M K and Lee S T 2003 Appl. Phys. Lett. 83 1875