Direct Al cathode layer sputtering on LiF/Alq 3 using facing target sputtering with a mixture of Ar and Kr

Applied Physics Letters

Volumn 88, Issue 8, 2006, Pages

  Kim, Han Ki ^a   Kim, Sang Woo ^a   Lee, Kyu Sung ^b   Kim, K H ^c  

^a Kumoh National Institute of Technology   (South Korea)

^b Samsung SDI   (South Korea)

^c Gachon University College of Medicine   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AL CATHODE SPUTTERING; FACING TARGET SPUTTERING (FTS); HEAVY NOBLE GAS MIXTURE; ORGANIC LIGHT EMITTING DIODES (OLED); PROTECTIVE LAYERS;

ALUMINUM; ARGON; KRYPTON; LEAKAGE CURRENTS; LIGHT EMITTING DIODES; PLASMAS;

SPUTTERING;

EID: 33644515649     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2178483     Document Type: Article

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