Twin facing target sputtering system for the deposition of multilayer and alloy films

Vacuum

Volumn 48, Issue 1, 1997, Pages 15-19

  Swarnalatha, M ^a   Mohan, S ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COPPER ALLOYS; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENTS; MULTILAYERS; PRESSURE EFFECTS; SUBSTRATES; THIN FILMS;

DEPOSITION RATE; DISCHARGE CURRENTS; FACING TARGET SPUTTERING; INTER TARGET DISTANCE;

SPUTTER DEPOSITION;

EID: 0030735524     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(96)00238-2     Document Type: Article

References (20)

1. Naoe, M., Yamanaka, S. and Hoshi, Y., IEEE Trans. Mag., 1980, 16, 646.
2. Matsuoka, M., Hoshi, Y. and Naoe, M., J. Appl. Phys., 1986, 60, 2096.
3. Kume, M., Kishimoto, D., Nakatsuka, Y. and Abe, Y., IEEE Trans. Mag., 1986, 22, 1161.
4. Hoshi, Y. and Naoe, M., IEEE Trans. Mag., 1991, 27, 4870.
5. Chapin, J.S., Res. Develop., 1974, 25, 37.
6. Thornton, J.A., J. Vac. Sci. Technol., 1978, 15, 171.
7. Escrivao, M.L., Moutinho, A.M.C. and Maneira, J.P., J. Vac. Sci. Technol., 1994, 12, 723.
8. Petrov, I., Ivanov, I., Orlinov, V. and Sundgren, J.E., J. Vac. Sci. Technol., 1993, 11, 2733.
9. Ivanov, I., Kazansky, P., Hultman, L., Petrov, I. and Sundgren, J.E., J. Vac. Sci. Technol., 1994, 12, 314.
10. Musil, J., Rusnak, K., Jezek, V. and Vicek, J., Vacuum, 1995, 46, 341.
11. Qihua Fan, J. Vac. Sci. Technol., 1992, A10, 3371.
12. Ito, H. and Naoe, M., IEEE Trans. Mag., 1990, 26, 181.
13. Kawanabe, T., Park, J. and Naoe, M., Mater. Sci. Engng, 1991, 134, 1305.
14. Song, K. and Naoe, M., Journal of Magnetics and Magnetic Materials, 1992, 104, 1855.
15. Fukizawa, A. and Naoe, M., IEEE Trans. Mag., 1987, 23, 140.
16. Jiang, E.Y., Wang, Z.J., Sun, C.Q., Lu, Q., Zhang, X.X. and Liu, Y.G., Journal of Magnetics and Magnetic Materials, 1989, 81, 25.
17. Hirata, T. and Naoe, M., J. Appl. Phys., 1990, 67, 5047.
18. Terada, N., Ihara, H., Jo, M., Hirabayashi, M., Kimura, Y., Matsutani, K., Hirata, K., Ohmo, E., Sugise, R. and Kawashima, F., Jap. J. Appl. Phys., 1988, 27, L639.
19. Akiyama, S., Nakagawa, S. and Naoe, M., Mater. Sci. Engng, 1991, 134, 1309.
20. Akiyama, S., Nakagawa, S. and Naoe, M., IEEE Trans. Mag., 1991, 27, 5094.