Sputter deposition of Al-doped ZnO films with various incident angles

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 5, 2009, Pages 1166-1171

  Sato, Yasushi ^a   Yanagisawa, Kei ^a   Oka, Nobuto ^a   Nakamura, Shin Ichi ^a   Shigesato, Yuzo ^a  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AL-DOPED ZNO; COLUMNAR STRUCTURES; FILM SURFACES; GLASS SUBSTRATES; INCIDENT ANGLES; NORMAL INCIDENCE; POLE FIGURE; PREFERRED ORIENTATIONS; SPUTTERED PARTICLES; SUBSTRATE PLANES; TILT ANGLE;

ALUMINUM; SEMICONDUCTING ZINC COMPOUNDS; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY; ZINC OXIDE;

SUBSTRATES;

EID: 70349118045     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3186618     Document Type: Article

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