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Volumn 86, Issue 18, 2005, Pages 1-3
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Plasma damage-free sputtering of indium tin oxide cathode layers for top-emitting organic light-emitting diodes
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CATHODES;
LEAKAGE CURRENTS;
LIGHT EMITTING DIODES;
MAGNETRON SPUTTERING;
MIRRORS;
PLASMA APPLICATIONS;
SCANNING ELECTRON MICROSCOPY;
SPUTTER DEPOSITION;
THIN FILMS;
X RAY DIFFRACTION ANALYSIS;
CATHODE LAYERS;
ENERGETIC PARTICLES;
INDIUM TIN OXIDE (ITO);
ORGANIC LIGHT-EMITTING DIODES;
INDIUM COMPOUNDS;
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EID: 20844458737
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1923182 Document Type: Article |
Times cited : (132)
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References (12)
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