Development of materials and processes for double patterning toward 32 nm node ArF immersion lithography

Journal of Photopolymer Science and Technology

Volumn 21, Issue 5, 2008, Pages 685-690

  Tarutani, Shinji ^a   Tsubaki, Hideaki ^a   Kanna, Shinichi ^a  

^a FUJIFILM CORPORATION   (Japan)

Author keywords

ArF immersion lithography; Double patterning; Negative tone imaging

Indexed keywords

EID: 51249120513     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.685     Document Type: Article

References (7)

1. International Technology Roadmap for Semiconductors: 2007 Litho ITRS Update, Lithography iTWG (2007)
2. Takuya Kono, Tatsuhiko Higashiki, Shinichi Ito, Soich Inoue, Tsukasa Azuma, Koji Hashimoto, Kazutaka Ishigo, Kazuya Sato, Masayuki Hatano, Hidefumi Mukai, Shoji Mimotogi, Kenji Kawano, Yuuki Ishii, Tomoharu Fujiwara, Shinji Wakamoto, Shoichi Owa: 4th International Symposium on Immersion Lithography, (2007) PR-01
3. Martin Drapeau, Vincent Wiaux, Eric Hendrickx, Staf Verhaegen, and Takahiro Machida: Proc. SPIE, 6521, (2007) 652109
4. M. Maenhoudt, J. Versluijs, H. Struyf, J. Van Olmen, and M. Van Hove: Proc. SPIE, 5754, (2005) 1508
5. Michael J. May, Samir Derrough, Arnaud Bazin, Benedicte Mortini, Cyril Brochon, and Georges Hadziioannou: J. Photopolymer Science and Technol. 20, (2007) 345
6. Wypych, George: Handbook of Solvents (2000) 112
7. Masafumi Asano: Jpn. J. Appl Phys. 38, (1999) 6999