Squeeze time investigations for step and flash imprint lithography

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 681-683

  Wuister, Sander F ^a   Lammers, Jeroen H ^a   Kruijt Stegeman, Yvonne W ^a   Tempel, Leendert van der ^a   Dijksman, Frits ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Fluid Mechanics; Nano imprint lithography; Throughput

Indexed keywords

FEATURE SIZES; RESIDUAL LAYER THICKNESS; RESIDUAL LAYERS; STEP-AND-FLASH IMPRINT LITHOGRAPHIES;

CONTACTS (FLUID MECHANICS); FLUID MECHANICS;

NANOIMPRINT LITHOGRAPHY;

EID: 67349243457     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.11.093     Document Type: Article

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