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Volumn 57, Issue 12, 2010, Pages 3231-3238

Quantum effects on the gate capacitance of trigate SOI MOSFETs

Author keywords

2 D Schr dinger Poisson; Gate capacitance; quantum capacitance; quantum effects; silicon nanowires; trigate MOSFET

Indexed keywords

GATE CAPACITANCE; QUANTUM CAPACITANCE; QUANTUM EFFECTS; SILICON NANOWIRES; TRI-GATE MOSFET;

EID: 78650012653     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2010.2077639     Document Type: Article
Times cited : (18)

References (24)
  • 1
    • 0029322021 scopus 로고
    • MOS transistors: Scaling and performance trends
    • Jun.
    • M. Bohr, "MOS transistors: Scaling and performance trends," Semicond. Int., vol. 18, no. 6, pp. 75-79, Jun. 1995
    • (1995) Semicond. Int. , vol.18 , Issue.6 , pp. 75-79
    • Bohr, M.1
  • 3
    • 0029535575 scopus 로고
    • Quantitative understanding of inversion-layer capacitance in Si MOSFETs
    • Dec.
    • S. Takagi and A. Toriumi, "Quantitative understanding of inversion-layer capacitance in Si MOSFETs," IEEE Trans. Electron Devices, vol. 42, no. 12, pp. 2125-2130, Dec. 1995.
    • (1995) IEEE Trans. Electron Devices , vol.42 , Issue.12 , pp. 2125-2130
    • Takagi, S.1    Toriumi, A.2
  • 5
    • 36549091403 scopus 로고
    • Quantum capacitance devices
    • Feb.
    • S. Luryi, "Quantum capacitance devices," Appl. Phys. Lett., vol. 52, no. 6, pp. 501-503, Feb. 1988.
    • (1988) Appl. Phys. Lett. , vol.52 , Issue.6 , pp. 501-503
    • Luryi, S.1
  • 6
    • 0031117193 scopus 로고    scopus 로고
    • Scaled silicon MOSFETs: Degradation of the total gate capacitance
    • Apr.
    • D. Vasileska, D. K. Schroder, and D. K. Ferry, "Scaled silicon MOSFETs: Degradation of the total gate capacitance," IEEE Trans. Electron Devices, vol. 44, no. 4, pp. 584-587, Apr. 1997.
    • (1997) IEEE Trans. Electron Devices , vol.44 , Issue.4 , pp. 584-587
    • Vasileska, D.1    Schroder, D.K.2    Ferry, D.K.3
  • 7
    • 0032630404 scopus 로고    scopus 로고
    • The influence of space quantization effects on the threshold voltage, inversion layer and total gate capacitances in scaled Si-MOSFETs
    • Jun.
    • D. Vasileska and D. K. Ferry, "The influence of space quantization effects on the threshold voltage, inversion layer and total gate capacitances in scaled Si-MOSFETs," Nanotechnology, vol. 10, no. 2, pp. 192-197, Jun. 1999.
    • (1999) Nanotechnology , vol.10 , Issue.2 , pp. 192-197
    • Vasileska, D.1    Ferry, D.K.2
  • 8
    • 40949165797 scopus 로고    scopus 로고
    • Influence of bandstructure and channel structure on the inversion layer capacitance of silicon and GaAs MOSFETs
    • Mar.
    • H. S. Pal, K. D. Cantley, S. S. Ahmed, and M. S. Lundstrom, "Influence of bandstructure and channel structure on the inversion layer capacitance of silicon and GaAs MOSFETs," IEEE Trans. Electron Devices, vol. 55, no. 3, pp. 904-908, Mar. 2008.
    • (2008) IEEE Trans. Electron Devices , vol.55 , Issue.3 , pp. 904-908
    • Pal, H.S.1    Cantley, K.D.2    Ahmed, S.S.3    Lundstrom, M.S.4
  • 14
    • 9744264882 scopus 로고    scopus 로고
    • Quantum capacitance in nanoscale device modeling
    • Nov.
    • D. L. John, L. C. Castro, and D. L. Pulfrey, "Quantum capacitance in nanoscale device modeling,"J. Appl. Phys., vol. 96, no. 9, pp. 5180-5184, Nov. 2004.
    • (2004) J. Appl. Phys. , vol.96 , Issue.9 , pp. 5180-5184
    • John, D.L.1    Castro, L.C.2    Pulfrey, D.L.3
  • 16
    • 41749110900 scopus 로고    scopus 로고
    • Outperforming the conventional scaling rules in the quantum-capacitance limit
    • Apr.
    • J. Knoch, W. Riess, and J. Appenzeller, "Outperforming the conventional scaling rules in the quantum-capacitance limit," IEEE Electron Device Lett., vol. 29, no. 4, pp. 372-374, Apr. 2008.
    • (2008) IEEE Electron Device Lett. , vol.29 , Issue.4 , pp. 372-374
    • Knoch, J.1    Riess, W.2    Appenzeller, J.3
  • 18
    • 33751237995 scopus 로고    scopus 로고
    • A numerical Schrödinger-Poisson solver for radially symmetric nanowire core-shell structures
    • Nov./Dec.
    • L. Wang, D. Wang, and P. M. Asbeck, "A numerical Schrödinger-Poisson solver for radially symmetric nanowire core-shell structures," Solid State Electron., vol. 50, no. 11/12, pp. 1732-1739, Nov./Dec. 2006.
    • (2006) Solid State Electron. , vol.50 , Issue.11-12 , pp. 1732-1739
    • Wang, L.1    Wang, D.2    Asbeck, P.M.3
  • 20
    • 38149018536 scopus 로고    scopus 로고
    • A comprehensive study of the corner effects in pi-gate SOI MOSFETs including quantum effects
    • Dec.
    • F. J. G. Ruiz, A. Godoy, F. Gámiz, C. Sampedro, and L. Donetti, "A comprehensive study of the corner effects in pi-gate SOI MOSFETs including quantum effects," IEEE Trans. Electron Devices, vol. 54, no. 12, pp. 3369-3377, Dec. 2007.
    • (2007) IEEE Trans. Electron Devices , vol.54 , Issue.12 , pp. 3369-3377
    • Ruiz, F.J.G.1    Godoy, A.2    Gámiz, F.3    Sampedro, C.4    Donetti, L.5
  • 21
    • 70350707600 scopus 로고    scopus 로고
    • Equivalent oxide thickness of trigate SOI MOSFETs with high-κ insulators
    • Nov.
    • F. J. G. Ruiz, I. M. Tienda-Luna, A. Godoy, L. Donetti, and F. Gámiz, "Equivalent oxide thickness of trigate SOI MOSFETs with high-κ insulators," IEEE Trans. Electron Devices, vol. 56, no. 11, pp. 2711-2719, Nov. 2009.
    • (2009) IEEE Trans. Electron Devices , vol.56 , Issue.11 , pp. 2711-2719
    • Ruiz, F.J.G.1    Tienda-Luna, I.M.2    Godoy, A.3    Donetti, L.4    Gámiz, F.5
  • 22
    • 78650023434 scopus 로고    scopus 로고
    • NEXTNANO\Next Generation 3D Nanodevice Simulator. [Online]. Available:
    • NEXTNANO\Next Generation 3D Nanodevice Simulator. [Online]. Available: www.nextnano.de/nextnano3
  • 24
    • 0036564041 scopus 로고    scopus 로고
    • Quantum C-V modeling in depletion and inversion: Accurate extraction of electrical thickness of gate oxide in deep submicron MOSFETs
    • May
    • W Quan, D. M. Kim, and H.-D. Lee, "Quantum C-V modeling in depletion and inversion: Accurate extraction of electrical thickness of gate oxide in deep submicron MOSFETs," IEEE Trans. Electron Devices, vol. 49, no. 5, pp. 889-894, May 2002
    • (2002) IEEE Trans. Electron Devices , vol.49 , Issue.5 , pp. 889-894
    • Quan, W.1    Kim, D.M.2    Lee, H.-D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.