Preparation, characterization and oxide CMP performance of composite polystyrene-core ceria-shell abrasives

Microelectronic Engineering

Volumn 88, Issue 2, 2011, Pages 200-205

  Chen, Yang ^a   Lu, Jinxia ^a   Chen, Zhigang ^b  

^a CHANGZHOU UNIVERSITY   (China)

^b SUZHOU UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Chemical mechanical polishing; Core shell structure; PS CeO2 composite abrasive

Indexed keywords

CHEMICAL PRECIPITATION; COMPOSITE ABRASIVES; COMPOSITE MICROSPHERES; COMPOSITE PARTICLES; CORE SHELL STRUCTURE; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; IN-SITU; MATERIAL REMOVAL RATE; OXIDE-CMP; PS/CEO2 COMPOSITE ABRASIVE; ROOT MEAN SQUARE ROUGHNESS; TEM; THERMAL OXIDE FILMS; TOPOGRAPHICAL VARIATIONS; ZETA POTENTIAL ANALYSIS;

ABRASIVES; ATOMIC FORCE MICROSCOPY; CERIUM COMPOUNDS; CHEMICAL MECHANICAL POLISHING; FIELD EMISSION; FIELD EMISSION MICROSCOPES; MICROSPHERES; NANOPARTICLES; OXIDE FILMS; POLISHING; POLYMER BLENDS; POLYSTYRENES; PRECIPITATION (CHEMICAL); SCANNING ELECTRON MICROSCOPY; SHELLS (STRUCTURES); SURFACE ROUGHNESS; THERMOGRAVIMETRIC ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZETA POTENTIAL;

CHEMICAL POLISHING;

EID: 78649921463     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2010.10.019     Document Type: Article

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