SCOPUS 정보 검색 플랫폼

Applied Surface Science

Volumn 193, Issue 1-4, 2002, Pages 144-148

X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films

(6) Jiang, Liudi a Fitzgerald, A G a Rose, M J a Cheung, R b Rong, B c Van Der Drift, E c

a UNIVERSITY OF DUNDEE (United Kingdom)

b UNIVERSITY OF EDINBURGH (United Kingdom)

c DELFT UNIVERSITY OF TECHNOLOGY (Netherlands)

Author keywords

Carbon nitride; Plasma etching; XPS

Indexed keywords

AMORPHOUS FILMS; CARBON NITRIDE; CRYSTAL MICROSTRUCTURE; ELECTRIC POTENTIAL; MAGNETRON SPUTTERING; OXYGEN; PLASMA ETCHING; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL ETCHANTS;

SURFACE TREATMENT;

EID: 0037024021 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(02)00225-8 Document Type: Article

Times cited : (25)

References (18)

1
- 20444373328
- (1989) Science , vol.245 , pp. 841
- Liu, A.Y.¹ Cohen, M.L.²

2
- 84975562085
- (1982) Appl. Opt. , vol.21 , pp. 3615
- Mckenzie, D.R.¹ McPhedran, R.C.² Botten, L.C.³ Savvides, N.⁴ Netterfield, R.P.⁵

3
- 0030126156
- (1996) J. Mater. Res. , vol.11 , pp. 981
- Sjöström, H.¹ Lanford, W.² Hjövarson, B.³ Xing, K.⁴ Sundgren, J.E.⁵

4
- 0023983419
- (1988) Solid State Commun. , vol.65 , pp. 921
- Han, H.X.¹ Feldman, B.J.²

5
- 0027626327
- (1993) Science , vol.261 , pp. 334
- Niu, C.¹ Lu, Y.Z.² Lieber, C.M.³

6
- 0001741428
- (1993) MRS Proc. , vol.280 , pp. 587
- Xion, F.¹ Chang, R.P.H.²

7
- 0029250683
- (1995) Thin Solid Films , vol.256 , pp. 148
- Wang, X.¹ Martin, P.J.²

8
- 0018986587
- (1981) J. Vac. Sci. Technol. , vol.18 , pp. 179
- Weissmantel, C.¹

9
- 0000811977
- (1997) J. Phys. Condens. Matter , vol.9 , pp. 1743
- Laidani, N.¹ Miotello, A.² Glisenti, A.³ Bottani, C.⁴ Perriere, J.⁵

10
- 0001420082
- (1995) Nucl. Instrum. Methods Phys. Res. B , vol.103 , pp. 309
- Xin, H.¹ Lin, C.² Zhu, S.³ Zou, S.⁴ Shi, X.⁵ Zhu, H.⁶ Hemment, P.L.F.⁷

11
- 0031208772
- (1997) J. Mater. Res. , vol.12 , pp. 2057
- Lee, D.-H.¹ Lee, H.² Park, B.³

12
- 0000364612
- (1998) Phys. Rev. B , vol.57
- Hu, J.¹ Yang, P.² Lieber, C.M.³

13
- 0034317290
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 3462
- Andriesse, M.S.P.¹ Zijlstra, T.² Van der Drift, E.³

14
- 12044253618
- (1994) Phys. Rev. Lett. , vol.73 , pp. 118
- Marton, D.¹ Boyd, K.J.² Al-Bayati, A.H.³ Todorov, S.S.⁴ Rabalais, J.W.⁵

15
- 0032673534
- (1999) Thin Solid Films , vol.343-344 , pp. 381
- Massi, M.¹ Mansano, R.D.² Maciel, H.S.³ Otani, C.⁴ Verdonck, P.⁵ Nishioka, L.N.B.M.⁶

16
- 0033076936
- (1999) Surf. Coat. Technol. , vol.112 , pp. 133
- Chowdhury, A.K.M.S.¹ Cameron, D.C.² Hashmi, M.S.J.³

17
- 0030487320
- (1996) J. Vac. Sci. Technol. A , vol.14 , pp. 2696
- Zheng, W.T.¹ Sjöström, H.² Ivanov, I.³ Xing, K.Z.⁴ Broitman, E.⁵ Salaneck, W.R.⁶ Greene, J.E.⁷ Sundgren, J.E.⁸

18
- 0033905258
- (2000) Diamond Rel. Mater. , vol.9 , pp. 212
- Fernández-Ramos, C.¹ Sayagués, M.J.² Rojas, T.C.³ Alcalá, M.D.⁴ Real, C.⁵ Fernández, A.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.