Prospects of phase resolved optical emission spectroscopy as a powerful diagnostic tool for RF-discharges

Contributions to Plasma Physics

Volumn 44, Issue 5-6, 2004, Pages 523-528

  Gans, T ^a,b   Schulz von Der Gathen, V ^a   Dobele H F ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

Optical emission spectroscopy; Population dynamics; RF discharge

Indexed keywords

DISTRIBUTION FUNCTIONS; DYNAMICS; ELECTRIC EXCITATION; EXCITED STATES; HYDROGEN; IMPACT IONIZATION; LIGHT EMISSION; POPULATION DYNAMICS; POPULATION STATISTICS;

CAPACITIVELY COUPLED RF DISCHARGE; DIAGNOSTICS TOOLS; EXCITATION PROCESS; EXCITED-STATES; MEASUREMENTS OF; OPTICAL-EMISSION SPECTROSCOPY; PHASE RESOLVED OPTICAL EMISSION SPECTROSCOPY; PHASE-RESOLVED MEASUREMENTS; RF DISCHARGE; SPATIAL AND TEMPORAL VARIATION;

OPTICAL EMISSION SPECTROSCOPY;

EID: 5644235238     PISSN: 08631042     EISSN: None     Source Type: Journal    
DOI: 10.1002/ctpp.200410074     Document Type: Conference Paper

References (15)

1. M.A. Lieberman, A.J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, John Wiley & Sons Inc., New York (1994).
2. H.M. Katsch, E. Quandt and Th. Schneider, Plasma Phys. Control. Fusion 38, 183 (1996).
3. I.P. Bogdanova, S.V. Yurgenson, Opt. Spektrosk. 61, 241 (1986).
4. J.E. Chilton, J.B. Boffard, R.S. Schappe, C.C. Lin, Phys. Rev. A 57, 267 (1998).
5. J.E. Chilton, M.D. Stewart, Jr., C.C. Lin, Phys. Rev. A 62, 32714 (2000).
6. J.E. Chilton, M.D. Stewart, Jr., C.C. Lin, Phys. Rev. A 61, 52708 (2000).
7. T. Gans, Chun C. Lin, V. Schulz-von der Gathen, H.F. Döbele, Phys. Rev. A 67, 012707 (2003).
8. U. Czarnetzki, D. Luggenhlscher, H.F. Döbele, Plasma Sources Sci. Technol. 8, 230 (1999).
9. T. Gans, Chun C. Lin, V. Schulz-von der Gathen, H.F. Döbele, J. Phys. D: Appl. Phys., 34, L39 (2001).
10. T. Gans, V. Schulz-von der Gathen, U. Czarnetzki, H.F. Döbele, Contr. Plasma Phys. 42, 596 (2002).
11. T. Gans, V. Schulz-von der Gathen, H.F. Döbele, Plasma Sources Sci. Technol., 10, 17 (2001).
12. K. Niemi, V. Schulz-von der Gathen, H.F. Döbele, J. Phys. D: Appl. Phys. 34, 2330 (2001).
13. H.M. Katsch, A. Tewes, E. Quandt, A. Goehlich, T. Kawetzki, H.F. Döbele, J. Appl. Phys. 88, 6232 (2000).
14. V. Schulz-von der Gathen, H.F. Döbele, Plasma Chem. Plasma Process. 16, 46 (1996).
15. V. Schulz-von der Gathen, M. Abdel-Rahman, T. Gans, H.F. Döbele, ICPIG XXVI (2003), Greifswald, Germany.