All-silicon polarizing filters for near-infrared wavelengths

Journal of Applied Physics

Volumn 95, Issue 1, 2004, Pages 402-404

  Wu, Qi Hong ^a   De Silva, Lakshman ^a   Arnold, Matthew ^a   Hodgkinson, Ian J ^a   Takeuchi, Eric ^b  

^a UNIVERSITY OF OTAGO   (New Zealand)

^b Photera Technologies   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; DEPOSITION; INFRARED RADIATION; INTERFACES (MATERIALS); LIGHT POLARIZATION; LIGHT REFLECTION; LIGHT TRANSMISSION; OPTICAL DESIGN; REFRACTIVE INDEX; SILICON; SILICON WAFERS; THIN FILMS;

ALL-SILICON POLARIZING FILTERS; FORM-BIREFRINGENT SILICON; NEAR-INFRARED WAVELENGTHS; SERIAL BIDEPOSITION METHOD;

OPTICAL FILTERS;

EID: 0942300835     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1627481     Document Type: Article

References (10)

1. D. Kovalev, G. Polisski, J. Diener, H. Heckler, N. Künzner, V. Yu. Timoshenko, and F. Koch, Appl. Phys. Lett. 78, 916 (2001).
2. F. Genereux, S. W. Leonard, H. M. van Driel, A. Birner, and U. Gösele, Phys. Rev. B 63, 161101 (2001).
3. D. Kovalev, G. Polisski, J. Diener, H. Heckler, N. Künzner, and F. Koch, Phys. Status Solidi A 180, R8 (2000).
4. I. J. Hodgkinson, Q. H. Wu, K. E. Thorn, and M. D. Arnold, Proc. Soc. Photo-Opt. Instrum. Eng. 4097, 266 (2000).
5. I. J. Hodgkinson, Q. H. Wu, M. D Arnold, and R. J. Blaikie, Microelectron. Eng. 57-58, 833 (2001).
6. N. Anscombe, Photonics Spectra February 2003.
7. S. Coffa, S. Libertino, G. Coppola, and A. Cutolo, IEEE J. Quantum Electron. 36, 1206 (2000).
8. I. J. Hodgkinson and Q. H. Wu, Birefringent Thin Films and Polarizing Elements (World Scientific, Singapore, 1998).
9. I. J. Hodgkinson, Q. H. Wu, and N. L. Moise, Opt. Laser Technol. 31, 295 (1999).
10. I. J. Hodgkinson and Q. H. Wu, Appl. Phys. Lett. 74, 1794 (1999).