-
1
-
-
0031334253
-
-
1058-4587,. 10.1080/10584589708013025
-
D. E. Kotecki, Integr. Ferroelectr. 1058-4587 16, 1 (1997). 10.1080/10584589708013025
-
(1997)
Integr. Ferroelectr.
, vol.16
, pp. 1
-
-
Kotecki, D.E.1
-
2
-
-
36449009699
-
-
0003-6951,. 10.1063/1.114795
-
C. S. Hwang, S. O. Park, H. -J. Cho, C. S. Kang, H. K. Kang, S. I. Lee, and M. Y. Lee, Appl. Phys. Lett. 0003-6951 67, 2819 (1995). 10.1063/1.114795
-
(1995)
Appl. Phys. Lett.
, vol.67
, pp. 2819
-
-
Hwang, C.S.1
Park, S.O.2
Cho, H.-J.3
Kang, C.S.4
Kang, H.K.5
Lee, S.I.6
Lee, M.Y.7
-
3
-
-
0037166485
-
-
0040-6090,. 10.1016/S0040-6090(02)00348-6
-
J. Im, O. Auciello, and S. K. Streiffer, Thin Solid Films 0040-6090 413, 243 (2002). 10.1016/S0040-6090(02)00348-6
-
(2002)
Thin Solid Films
, vol.413
, pp. 243
-
-
Im, J.1
Auciello, O.2
Streiffer, S.K.3
-
4
-
-
0031636466
-
-
0084-6600,. 10.1146/annurev.matsci.28.1.397
-
D. Dimos and C. H. Mueller, Annu. Rev. Mater. Sci. 0084-6600 28, 397 (1998). 10.1146/annurev.matsci.28.1.397
-
(1998)
Annu. Rev. Mater. Sci.
, vol.28
, pp. 397
-
-
Dimos, D.1
Mueller, C.H.2
-
5
-
-
18644375094
-
-
0021-8979,. 10.1063/1.1505999
-
M. W. Cole, P. C. Joshi, M. Ervin, M. Wood, and R. L. Pfeffer, J. Appl. Phys. 0021-8979 92, 3967 (2002). 10.1063/1.1505999
-
(2002)
J. Appl. Phys.
, vol.92
, pp. 3967
-
-
Cole, M.W.1
Joshi, P.C.2
Ervin, M.3
Wood, M.4
Pfeffer, R.L.5
-
6
-
-
28444473063
-
-
0003-6951,. 10.1063/1.2136429
-
D. S. Jeong, C. S. Hwang, J. D. Baniecki, T. Shioga, K. Kurihara, N. Kamehara, and M. Ishii, Appl. Phys. Lett. 0003-6951 87, 232903 (2005). 10.1063/1.2136429
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 232903
-
-
Jeong, D.S.1
Hwang, C.S.2
Baniecki, J.D.3
Shioga, T.4
Kurihara, K.5
Kamehara, N.6
Ishii, M.7
-
7
-
-
10444281997
-
-
0021-4922,. 10.1143/JJAP.43.6740
-
I. P. Koutsaroff, T. A. Bernacki, M. Zelner, A. Cervin-Lawry, T. Jimbo, and K. Suu, Jpn. J. Appl. Phys., Part 1 0021-4922 43, 6740 (2004). 10.1143/JJAP.43.6740
-
(2004)
Jpn. J. Appl. Phys., Part 1
, vol.43
, pp. 6740
-
-
Koutsaroff, I.P.1
Bernacki, T.A.2
Zelner, M.3
Cervin-Lawry, A.4
Jimbo, T.5
Suu, K.6
-
8
-
-
43349108765
-
-
0003-6951,. 10.1063/1.2919080
-
M. W. Cole, C. V. Weiss, E. Ngo, S. Hirsch, L. A. Coryell, and S. P. Alpay, Appl. Phys. Lett. 0003-6951 92, 182906 (2008). 10.1063/1.2919080
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 182906
-
-
Cole, M.W.1
Weiss, C.V.2
Ngo, E.3
Hirsch, S.4
Coryell, L.A.5
Alpay, S.P.6
-
9
-
-
8644226934
-
-
0003-6951,. 10.1063/1.1801176
-
S. W. Liu, Y. Lin, J. Weaver, W. Donner, X. Chen, C. L. Chen, J. C. Jiang, E. I. Meletis, and A. Bhalla, Appl. Phys. Lett. 0003-6951 85, 3202 (2004). 10.1063/1.1801176
-
(2004)
Appl. Phys. Lett.
, vol.85
, pp. 3202
-
-
Liu, S.W.1
Lin, Y.2
Weaver, J.3
Donner, W.4
Chen, X.5
Chen, C.L.6
Jiang, J.C.7
Meletis, E.I.8
Bhalla, A.9
-
10
-
-
17444420756
-
-
0003-6951,. 10.1063/1.1897047
-
T. Yamada, K. F. Astafiev, V. O. Sherman, A. K. Tagantsev, P. Muralt, and N. Setter, Appl. Phys. Lett. 0003-6951 86, 142904 (2005). 10.1063/1.1897047
-
(2005)
Appl. Phys. Lett.
, vol.86
, pp. 142904
-
-
Yamada, T.1
Astafiev, K.F.2
Sherman, V.O.3
Tagantsev, A.K.4
Muralt, P.5
Setter, N.6
-
11
-
-
0036678679
-
-
0021-8979,. 10.1063/1.1491996
-
W. Chang, S. W. Kirchoefer, J. M. Pond, J. S. Horwitz, and L. Sengupta, J. Appl. Phys. 0021-8979 92, 1528 (2002). 10.1063/1.1491996
-
(2002)
J. Appl. Phys.
, vol.92
, pp. 1528
-
-
Chang, W.1
Kirchoefer, S.W.2
Pond, J.M.3
Horwitz, J.S.4
Sengupta, L.5
-
12
-
-
34047252168
-
-
0003-6951,. 10.1063/1.2719673
-
T. Yamada, P. Muralt, V. O. Sherman, C. S. Sandu, and N. Setter, Appl. Phys. Lett. 0003-6951 90, 142911 (2007). 10.1063/1.2719673
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 142911
-
-
Yamada, T.1
Muralt, P.2
Sherman, V.O.3
Sandu, C.S.4
Setter, N.5
-
13
-
-
71549172506
-
-
0003-6951,. 10.1063/1.3266862
-
B. Xiao, H. R. Liu, V. Avrutin, J. H. Leach, E. Rowe, H. Y. Liu, Ü. Özgür, H. Morko̧, W. Chang, L. M. B. Alldredge, S. W. Kirchoefer, and J. M. Pond, Appl. Phys. Lett. 0003-6951 95, 212901 (2009). 10.1063/1.3266862
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 212901
-
-
Xiao, B.1
Liu, H.R.2
Avrutin, V.3
Leach, J.H.4
Rowe, E.5
Liu, H.Y.6
Özgür, Ü.7
Morko̧, H.8
Chang, W.9
Alldredge, L.M.B.10
Kirchoefer, S.W.11
Pond, J.M.12
-
14
-
-
77956376224
-
-
0002-7820.
-
L. H. Yang, G. S. Wang, D. Ŕmiens, and X. L. Dong, J. Am. Ceram. Soc. 0002-7820 93, 2526 (2010).
-
(2010)
J. Am. Ceram. Soc.
, vol.93
, pp. 2526
-
-
Yang, L.H.1
Wang, G.S.2
Ŕmiens, D.3
Dong, X.L.4
-
15
-
-
77954063261
-
-
0003-6951,. 10.1063/1.3454772
-
F. Ponchel, J. -F. Legier, C. Soyer, D. Ŕmiens, J. Midy, T. Lasri, and G. Gúguan, Appl. Phys. Lett. 0003-6951 96, 252906 (2010). 10.1063/1.3454772
-
(2010)
Appl. Phys. Lett.
, vol.96
, pp. 252906
-
-
Ponchel, F.1
Legier, J.-F.2
Soyer, C.3
Ŕmiens, D.4
Midy, J.5
Lasri, T.6
Gúguan, G.7
-
16
-
-
77949686154
-
-
0021-8979,. 10.1063/1.3309423
-
F. Ponchel, J. Midy, J. F. Legier, C. Soyer, D. Ŕmiens, T. Lasri, and G. Gúguan, J. Appl. Phys. 0021-8979 107, 054112 (2010). 10.1063/1.3309423
-
(2010)
J. Appl. Phys.
, vol.107
, pp. 054112
-
-
Ponchel, F.1
Midy, J.2
Legier, J.F.3
Soyer, C.4
Ŕmiens, D.5
Lasri, T.6
Gúguan, G.7
-
17
-
-
58149265167
-
-
0957-4484,. 10.1088/0957-4484/19/48/485704
-
A. L. Campbell, R. R. Biggers, G. Subramanyam, G. Kozlowski, R. A. Kleismit, H. N. Zate, S. C. Hopkins, B. A. Glowacki, B. D. Riehl, and T. L. Peterson, Nanotechnology 0957-4484 19, 485704 (2008). 10.1088/0957-4484/19/48/ 485704
-
(2008)
Nanotechnology
, vol.19
, pp. 485704
-
-
Campbell, A.L.1
Biggers, R.R.2
Subramanyam, G.3
Kozlowski, G.4
Kleismit, R.A.5
Zate, H.N.6
Hopkins, S.C.7
Glowacki, B.A.8
Riehl, B.D.9
Peterson, T.L.10
-
18
-
-
0032547662
-
-
0003-6951,. 10.1063/1.121691
-
B. H. Hoerman, G. M. Ford, L. D. Kaufmann, and B. W. Wessels, Appl. Phys. Lett. 0003-6951 73, 2248 (1998). 10.1063/1.121691
-
(1998)
Appl. Phys. Lett.
, vol.73
, pp. 2248
-
-
Hoerman, B.H.1
Ford, G.M.2
Kaufmann, L.D.3
Wessels, B.W.4
-
19
-
-
0000897749
-
-
0003-6951,. 10.1063/1.120796
-
J. D. Baniecki, R. B. Laibowitz, T. M. Shaw, P. R. Duncombe, D. A. Neumayer, D. E. Kotecki, H. Shen, and Q. Y. Ma, Appl. Phys. Lett. 0003-6951 72, 498 (1998). 10.1063/1.120796
-
(1998)
Appl. Phys. Lett.
, vol.72
, pp. 498
-
-
Baniecki, J.D.1
Laibowitz, R.B.2
Shaw, T.M.3
Duncombe, P.R.4
Neumayer, D.A.5
Kotecki, D.E.6
Shen, H.7
Ma, Q.Y.8
-
20
-
-
0942266894
-
-
0003-6951,. 10.1063/1.1635967
-
T. Hamano, D. J. Towner, and B. W. Wessels, Appl. Phys. Lett. 0003-6951 83, 5274 (2003). 10.1063/1.1635967
-
(2003)
Appl. Phys. Lett.
, vol.83
, pp. 5274
-
-
Hamano, T.1
Towner, D.J.2
Wessels, B.W.3
-
21
-
-
33646710366
-
-
0003-6951,. 10.1063/1.2202748
-
J. -Y. Kim and A. M. Grishin, Appl. Phys. Lett. 0003-6951 88, 192905 (2006). 10.1063/1.2202748
-
(2006)
Appl. Phys. Lett.
, vol.88
, pp. 192905
-
-
Kim, J.-Y.1
Grishin, A.M.2
-
22
-
-
79956021755
-
-
0003-6951,. 10.1063/1.1499987
-
S. V. Razumov, A. V. Tumarkin, M. M. Gaidukov, A. G. Gagarin, A. B. Kozyrev, O. G. Vendik, A. V. Ivanov, O. U. Buslov, V. N. Keys, L. C. Sengupta, and X. Zhang, Appl. Phys. Lett. 0003-6951 81, 1675 (2002). 10.1063/1.1499987
-
(2002)
Appl. Phys. Lett.
, vol.81
, pp. 1675
-
-
Razumov, S.V.1
Tumarkin, A.V.2
Gaidukov, M.M.3
Gagarin, A.G.4
Kozyrev, A.B.5
Vendik, O.G.6
Ivanov, A.V.7
Buslov, O.U.8
Keys, V.N.9
Sengupta, L.C.10
Zhang, X.11
-
23
-
-
33746047122
-
-
0003-6951,. 10.1063/1.2220530
-
E. A. Fardin, A. S. Holland, K. Ghorbani, and P. Reichart, Appl. Phys. Lett. 0003-6951 89, 022901 (2006). 10.1063/1.2220530
-
(2006)
Appl. Phys. Lett.
, vol.89
, pp. 022901
-
-
Fardin, E.A.1
Holland, A.S.2
Ghorbani, K.3
Reichart, P.4
-
24
-
-
33846584150
-
-
0003-6951,. 10.1063/1.2431708
-
Y. Wang, B. T. Liu, Z. M. Yang, and J. Du, Appl. Phys. Lett. 0003-6951 90, 042905 (2007). 10.1063/1.2431708
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 042905
-
-
Wang, Y.1
Liu, B.T.2
Yang, Z.M.3
Du, J.4
-
25
-
-
1842484069
-
-
1385-3449,. 10.1023/B:JECR.0000015661.81386.e6
-
A. K. Tagantsev, V. O. Sherman, K. F. Astafiev, J. Venkatesh, and N. Setter, J. Electroceram. 1385-3449 11, 5 (2003). 10.1023/B:JECR.0000015661. 81386.e6
-
(2003)
J. Electroceram.
, vol.11
, pp. 5
-
-
Tagantsev, A.K.1
Sherman, V.O.2
Astafiev, K.F.3
Venkatesh, J.4
Setter, N.5
-
26
-
-
33748467174
-
-
0003-6951,. 10.1063/1.2236099
-
H. S. Kim, T. S. Hyun, H. G. Kim, I. D. Kim, T. S. Yun, and J. C. Lee, Appl. Phys. Lett. 0003-6951 89, 052902 (2006). 10.1063/1.2236099
-
(2006)
Appl. Phys. Lett.
, vol.89
, pp. 052902
-
-
Kim, H.S.1
Hyun, T.S.2
Kim, H.G.3
Kim, I.D.4
Yun, T.S.5
Lee, J.C.6
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