SCOPUS 정보 검색 플랫폼

Electrochemical and Solid-State Letters

Volumn 13, Issue 12, 2010, Pages

Effect of zn concentration on multiferroic and fatigue behavior of Bi 0.90 La0.10 Fe1-x Znx O3 thin films

(2) Wu, Jiagang a Wang, John a

a NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH FERRITES; DIELECTRIC PERMITTIVITIES; ELECTRICAL BEHAVIORS; FATIGUE BEHAVIOR; FATIGUE ENDURANCES; FERROELECTRIC BEHAVIOR; FILM COMPOSITION; IN-SITU; MULTIFERROICS; NONMAGNETICS; RADIO FREQUENCY SPUTTERING; SI (100) SUBSTRATE; ZN CONTENT;

BISMUTH; OXYGEN; OXYGEN VACANCIES; SILICON COMPOUNDS; SPUTTERING; THIN FILMS; VAPOR DEPOSITION;

ZINC;

EID: 77958484317 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.3490762 Document Type: Article

Times cited : (8)

References (33)

1
- 33846006566
- Multiferroics: Progress and prospects in thin films
- DOI 10.1038/nmat1805, PII NMAT1805
- R. Ramesh and N. A. Spaldin, Nature Mater. NMAACR 1476-1122, 6, 21 (2007). 10.1038/nmat1805 (Pubitemid 46043269)
- (2007) Nature Materials , vol.6 , Issue.1 , pp. 21-29
- Ramesh, R.¹ Spaldin, N.A.²

2
- 77955657137
- MIGIEA 0927-796X,. 10.1016/j.mser.2010.03.001
- L. W. Martin, Y.-H. Chu, and R. Ramesh, Mater. Sci. Eng. R. MIGIEA 0927-796X, 68, 89 (2010). 10.1016/j.mser.2010.03.001
- (2010) Mater. Sci. Eng. R. , vol.68 , pp. 89
- Martin, L.W.¹ Chu, Y.-H.² Ramesh, R.³

3
- 67649246400
- ADVMEW 0935-9648,. 10.1002/adma.200802849
- G. Catalan and J. F. Scott, Adv. Mater. ADVMEW 0935-9648, 21, 2463 (2009). 10.1002/adma.200802849
- (2009) Adv. Mater. , vol.21 , pp. 2463
- Catalan, G.¹ Scott, J.F.²

4
- 69849100381
- ADPHAH 0001-8732,. 10.1080/00018730902920554
- K. F. Wang, J. M. Liu, and Z. F. Ren, Adv. Phys. ADPHAH 0001-8732, 58, 321 (2009). 10.1080/00018730902920554
- (2009) Adv. Phys. , vol.58 , pp. 321
- Wang, K.F.¹ Liu, J.M.² Ren, Z.F.³

5
- 0037436499
- 3 multiferroic thin film heterostructures
- DOI 10.1126/science.1080615
- J. Wang, J. B. Neaton, H. Zheng, V. Nagarajan, S. B. Ogale, B. Liu, D. Viehland, V. Vaithyanathan, D. G. Schlom, U. V. Waghmare, Science SCIEAS 0036-8075, 299, 1719 (2003). 10.1126/science.1080615 (Pubitemid 36337195)
- (2003) Science , vol.299 , Issue.5613 , pp. 1719-1722
- Wang, J.¹ Neaton, J.B.² Zheng, H.³ Nagarajan, V.⁴ Ogale, S.B.⁵ Liu, B.⁶ Viehland, D.⁷ Vaithyanathan, V.⁸ Schlom, D.G.⁹ Waghmare, U.V.¹⁰ Spaldin, N.A.¹¹ Rabe, K.M.¹² Wuttig, M.¹³ Ramesh, R.¹⁴

6
- 3142641245
- JAPLD8 0021-4922,. 10.1143/JJAP.43.L647
- K. Y. Yun, D. Ricinschi, T. Kanashima, M. Noda, and M. Okuyama, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922, 43, L647 (2004). 10.1143/JJAP.43.L647
- (2004) Jpn. J. Appl. Phys., Part 2 , vol.43 , pp. 647
- Yun, K.Y.¹ Ricinschi, D.² Kanashima, T.³ Noda, M.⁴ Okuyama, M.⁵

7
- 18744378644
- Greatly reduced leakage current and conduction mechanism in aliovalent-ion-doped BiFeO3
- DOI 10.1063/1.1862336, 062903
- X. Qi, J. Dho, R. Tomov, M. G. Blamire, and J. L. MacManus-Driscoll, Appl. Phys. Lett. APPLAB 0003-6951, 86, 062903 (2005). 10.1063/1.1862336 (Pubitemid 40665522)
- (2005) Applied Physics Letters , vol.86 , Issue.6 , pp. 1-3
- Qi, X.¹ Dho, J.² Tomov, R.³ Blamire, M.G.⁴ MacManus-Driscoll, J.L.⁵

8
- 34548066514
- Temperature-dependent leakage mechanisms of PtBiFe O3 SrRu O3 thin film capacitors
- DOI 10.1063/1.2772666
- H. Yang, M. Jain, N. A. Suvorova, H. Zhou, H. M. Luo, D. M. Feldmann, P. C. Dowden, R. F. DePaula, S. R. Foltyn, and Q. X. Jia, Appl. Phys. Lett. APPLAB 0003-6951, 91, 072911 (2007). 10.1063/1.2772666 (Pubitemid 47287649)
- (2007) Applied Physics Letters , vol.91 , Issue.7 , pp. 072911
- Yang, H.¹ Jain, M.² Suvorova, N.A.³ Zhou, H.⁴ Luo, H.M.⁵ Feldmann, D.M.⁶ Dowden, P.C.⁷ Depaula, R.F.⁸ Foltyn, S.R.⁹ Jia, Q.X.¹⁰

9
- 65449163069
- APPLAB 0003-6951,. 10.1063/1.3127519
- J. G. Wu, G. Q. Kang, H. J. Liu, and J. Wang, Appl. Phys. Lett. APPLAB 0003-6951, 94, 172906 (2009). 10.1063/1.3127519
- (2009) Appl. Phys. Lett. , vol.94 , pp. 172906
- Wu, J.G.¹ Kang, G.Q.² Liu, H.J.³ Wang, J.⁴

10
- 71949125061
- APPLAB 0003-6951,. 10.1063/1.3271032
- H. Y. Zhao, H. Kimura, Z. X. Cheng, X. L. Wang, and T. Nishida, Appl. Phys. Lett. APPLAB 0003-6951, 95, 232904 (2009). 10.1063/1.3271032
- (2009) Appl. Phys. Lett. , vol.95 , pp. 232904
- Zhao, H.Y.¹ Kimura, H.² Cheng, Z.X.³ Wang, X.L.⁴ Nishida, T.⁵

11
- 33746095788
- Investigation on the origin of the magnetic moment of BiFeO3 thin films by advanced x-ray characterizations
- DOI 10.1103/PhysRevB.74.020101
- H. B́a, M. Bibes, S. Fusil, K. Bouzehouane, E. Jacquet, K. Rode, P. Bencok, and A. Barth́ĺmy, Phys. Rev. B PLRBAQ 0556-2805, 74, 020101 (2006). 10.1103/PhysRevB.74.020101 (Pubitemid 44079232)
- (2006) Physical Review B - Condensed Matter and Materials Physics , vol.74 , Issue.2 , pp. 020101
- Bea, H.¹ Bibes, M.² Fusil, S.³ Bouzehouane, K.⁴ Jacquet, E.⁵ Rode, K.⁶ Bencok, P.⁷ Barthelemy, A.⁸

12
- 74549186581
- ACMAFD 1359-6454,. 10.1016/j.actamat.2009.11.011
- J. G. Wu and J. Wang, Acta Mater. ACMAFD 1359-6454, 58, 1688 (2010). 10.1016/j.actamat.2009.11.011
- (2010) Acta Mater. , vol.58 , pp. 1688
- Wu, J.G.¹ Wang, J.²

13
- 76949099337
- JAPIAU 0021-8979,. 10.1063/1.3296226
- J. G. Wu and J. Wang, J. Appl. Phys. JAPIAU 0021-8979, 107, 034103 (2010). 10.1063/1.3296226
- (2010) J. Appl. Phys. , vol.107 , pp. 034103
- Wu, J.G.¹ Wang, J.²

14
- 28344446250
- 3 thin films with reduced leakage current
- DOI 10.1063/1.2112181, 172901
- Y.-H. Lee, J.-M. Wu, and Y.-L. Chueh, L.-J. Chou, Appl. Phys. Lett. APPLAB 0003-6951, 87, 172901 (2005). 10.1063/1.2112181 (Pubitemid 41716990)
- (2005) Applied Physics Letters , vol.87 , Issue.17 , pp. 1-3
- Lee, Y.-H.¹ Wu, J.-M.² Chueh, Y.-L.³ Chou, L.-J.⁴

15
- 58149215604
- JAPIAU 0021-8979,. 10.1063/1.3054169
- Y. Wang, Y. H. Lin, and C. W. Nan, J. Appl. Phys. JAPIAU 0021-8979, 104, 123912 (2008). 10.1063/1.3054169
- (2008) J. Appl. Phys. , vol.104 , pp. 123912
- Wang, Y.¹ Lin, Y.H.² Nan, C.W.³

16
- 36248930886
- Microstructure and frequency dependent electrical properties of Mn-substituted BiFe O3 thin films
- DOI 10.1063/1.2812594
- S. K. Singh, H. Ishiwara, K. Sato, and K. Maruyama, J. Appl. Phys. JAPIAU 0021-8979, 102, 094109 (2007). 10.1063/1.2812594 (Pubitemid 350129037)
- (2007) Journal of Applied Physics , vol.102 , Issue.9 , pp. 094109
- Singh, S.K.¹ Ishiwara, H.² Sato, K.³ Maruyama, K.⁴

17
- 67650757430
- JAPIAU 0021-8979,. 10.1063/1.3158556
- N. M. Murari, R. Thomas, R. E. Melgarejo, S. P. Pavunny, and R. S. Katiyar, J. Appl. Phys. JAPIAU 0021-8979, 106, 014103 (2009). 10.1063/1.3158556
- (2009) J. Appl. Phys. , vol.106 , pp. 014103
- Murari, N.M.¹ Thomas, R.² Melgarejo, R.E.³ Pavunny, S.P.⁴ Katiyar, R.S.⁵

18
- 63049106713
- APPLAB 0003-6951,. 10.1063/1.3098408
- T. Kawae, Y. Terauchi, H. Tsuda, M. Kumeda, and A. Morimoto, Appl. Phys. Lett. APPLAB 0003-6951, 94, 112904 (2009). 10.1063/1.3098408
- (2009) Appl. Phys. Lett. , vol.94 , pp. 112904
- Kawae, T.¹ Terauchi, Y.² Tsuda, H.³ Kumeda, M.⁴ Morimoto, A.⁵

19
- 1842581494
- APPLAB 0003-6951,. 10.1063/1.1667612
- Y. P. Wang, L. Zhou, M. F. Zhang, X. Y. Chen, J. M. Liu, and Z. G. Liu, Appl. Phys. Lett. APPLAB 0003-6951, 84, 1731 (2004). 10.1063/1.1667612
- (2004) Appl. Phys. Lett. , vol.84 , pp. 1731
- Wang, Y.P.¹ Zhou, L.² Zhang, M.F.³ Chen, X.Y.⁴ Liu, J.M.⁵ Liu, Z.G.⁶

20
- 28044456595
- 3 thin films fabricated by chemical solution deposition
- DOI 10.1143/JJAP.44.L561
- H. Uchida, R. Ueno, H. Nakaki, H. Funakubo, and S. Koda, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922, 44, L561 (2005). 10.1143/JJAP.44.L561 (Pubitemid 43078348)
- (2005) Japanese Journal of Applied Physics, Part 2: Letters , vol.44 , Issue.16-19
- Uchida, H.¹ Ueno, R.² Nakaki, H.³ Funakubo, H.⁴ Koda, S.⁵

21
- 20844441189
- 3 magnetoferroelectric thin films
- DOI 10.1063/1.1941474, 222903
- D. Lee, M. G. Kim, S. Ryu, and H. M. Jang, Appl. Phys. Lett. APPLAB 0003-6951, 86, 222903 (2005). 10.1063/1.1941474 (Pubitemid 40861612)
- (2005) Applied Physics Letters , vol.86 , Issue.22 , pp. 1-3
- Lee, D.¹ Kim, M.G.² Ryu, S.³ Jang, H.M.⁴ Lee, S.G.⁵

22
- 31544473506
- 3 thin films
- DOI 10.1063/1.2167793, 042903
- Y. H. Lee, J. M. Wu, and C. H. Lai, Appl. Phys. Lett. APPLAB 0003-6951, 88, 042903 (2006). 10.1063/1.2167793 (Pubitemid 43164076)
- (2006) Applied Physics Letters , vol.88 , Issue.4 , pp. 1-3
- Lee, Y.-H.¹ Wu, J.-M.² Lai, C.-H.³

23
- 34247519198
- 3 thin films
- DOI 10.1088/0022-3727/40/9/004, PII S0022372707376390, 004
- S. K. Singh, K. Maruyama, and H. Ishiwara, J. Phys. D JPAPBE 0022-3727, 40, 2705 (2007). 10.1088/0022-3727/40/9/004 (Pubitemid 46646693)
- (2007) Journal of Physics D: Applied Physics , vol.40 , Issue.9 , pp. 2705-2709
- Singh, S.K.¹ Maruyama, K.² Ishiwara, H.³

24
- 44049109248
- 3 thin film
- DOI 10.1063/1.2918130
- G. D. Hu, S. H. Fan, C. H. Yang, and W. B. Wu, Appl. Phys. Lett. APPLAB 0003-6951, 92, 192905 (2008). 10.1063/1.2918130 (Pubitemid 351713472)
- (2008) Applied Physics Letters , vol.92 , Issue.19 , pp. 192905
- Hu, G.D.¹ Fan, S.H.² Yang, C.H.³ Wu, W.B.⁴

25
- 67649763952
- JAPIAU 0021-8979,. 10.1063/1.3063813
- A. Lahmar, S. Habouti, C. H. Solterbeck, M. Es-Souni, and B. Elouadi, J. Appl. Phys. JAPIAU 0021-8979, 105, 014111 (2009). 10.1063/1.3063813
- (2009) J. Appl. Phys. , vol.105 , pp. 014111
- Lahmar, A.¹ Habouti, S.² Solterbeck, C.H.³ Es-Souni, M.⁴ Elouadi, B.⁵

26
- 70349330333
- JAPIAU 0021-8979,. 10.1063/1.3213335
- J. G. Wu and J. Wang, J. Appl. Phys. JAPIAU 0021-8979, 106, 054115 (2009). 10.1063/1.3213335
- (2009) J. Appl. Phys. , vol.106 , pp. 054115
- Wu, J.G.¹ Wang, J.²

27
- 41149113871
- PLRBAQ 0556-2805,. 10.1103/PhysRevB.77.092101
- Z. X. Cheng, X. L. Wang, S. X. Dou, H. Kimura, and K. Ozawa, Phys. Rev. B PLRBAQ 0556-2805, 77, 092101 (2008). 10.1103/PhysRevB.77.092101
- (2008) Phys. Rev. B , vol.77 , pp. 092101
- Cheng, Z.X.¹ Wang, X.L.² Dou, S.X.³ Kimura, H.⁴ Ozawa, K.⁵

28
- 34548698689
- Reduced leakage current in la and Ni codoped BiFe O3 thin films
- DOI 10.1063/1.2784968
- S. K. Singh, K. Maruyama, and H. Ishiwara, Appl. Phys. Lett. APPLAB 0003-6951, 91, 112913 (2007). 10.1063/1.2784968 (Pubitemid 47416016)
- (2007) Applied Physics Letters , vol.91 , Issue.11 , pp. 112913
- Singh, S.K.¹ Maruyama, K.² Ishiwara, H.³

29
- 77955826156
- JAPIAU 0021-8979,. 10.1063/1.3452348
- J. G. Wu and J. Wang, J. Appl. Phys. JAPIAU 0021-8979, 108, 024104 (2010). 10.1063/1.3452348
- (2010) J. Appl. Phys. , vol.108 , pp. 024104
- Wu, J.G.¹ Wang, J.²

30
- 72049128033
- JALCEU 0925-8388,. 10.1016/j.jallcom.2009.05.129
- Q. Xu, H. Zai, D. Wu, Y. K. Tang, and M. X. Xu, J. Alloys Compd. JALCEU 0925-8388, 485, 13 (2009). 10.1016/j.jallcom.2009.05.129
- (2009) J. Alloys Compd. , vol.485 , pp. 13
- Xu, Q.¹ Zai, H.² Wu, D.³ Tang, Y.K.⁴ Xu, M.X.⁵

31
- 3142655788
- APPLAB 0003-6951,. 10.1063/1.1764944
- J. F. Li, J. L. Wang, M. Wuttig, R. Ramesh, N. Wang, B. Ruette, A. P. Pyatakov, A. K. Zvezdin, and D. Viehland, Appl. Phys. Lett. APPLAB 0003-6951, 84, 5261 (2004). 10.1063/1.1764944
- (2004) Appl. Phys. Lett. , vol.84 , pp. 5261
- Li, J.F.¹ Wang, J.L.² Wuttig, M.³ Ramesh, R.⁴ Wang, N.⁵ Ruette, B.⁶ Pyatakov, A.P.⁷ Zvezdin, A.K.⁸ Viehland, D.⁹

32
- 18944368523
- SCIEAS 0036-8075,. 10.1126/science.1105422
- W. Eerenstein, F. D. Morrison, J. Dho, M. G. Blamire, J. F. Scott, and N. D. Mathur, Science SCIEAS 0036-8075, 307, 1203a (2005). 10.1126/science.1105422
- (2005) Science , vol.307
- Eerenstein, W.¹ Morrison, F.D.² Dho, J.³ Blamire, M.G.⁴ Scott, J.F.⁵ Mathur, N.D.⁶

33
- 0001108933
- APPLAB 0003-6951,. 10.1063/1.125938
- M. Dawber and J. F. Scott, Appl. Phys. Lett. APPLAB 0003-6951, 76, 1060 (2000). 10.1063/1.125938
- (2000) Appl. Phys. Lett. , vol.76 , pp. 1060
- Dawber, M.¹ Scott, J.F.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.