-
1
-
-
0037436499
-
3 multiferroic thin film heterostructures
-
DOI 10.1126/science.1080615
-
J. Wang, J. B. Neaton, H. Zheng, V. Nagarajan, S. B. Ogale, B. Liu, D. Viehland, V. Vaithyanathan, D. G. Schlom, U. V. Waghmare, N. A. Spaldin, K. M. Rabe, M. Wuttig, and R. Ramesh, Science 0036-8075 299, 1719 (2003). 10.1126/science.1080615 (Pubitemid 36337195)
-
(2003)
Science
, vol.299
, Issue.5613
, pp. 1719-1722
-
-
Wang, J.1
Neaton, J.B.2
Zheng, H.3
Nagarajan, V.4
Ogale, S.B.5
Liu, B.6
Viehland, D.7
Vaithyanathan, V.8
Schlom, D.G.9
Waghmare, U.V.10
Spaldin, N.A.11
Rabe, K.M.12
Wuttig, M.13
Ramesh, R.14
-
2
-
-
64249168806
-
-
0028-0836
-
T. Choi, S. Lee, Y. J. Choi, V. Kiryukhin, and S. W. Cheong, Nature (London) 0028-0836 324, 63 (2009).
-
(2009)
Nature (London)
, vol.324
, pp. 63
-
-
Choi, T.1
Lee, S.2
Choi, Y.J.3
Kiryukhin, V.4
Cheong, S.W.5
-
3
-
-
33748892269
-
Ferroelectric thin films: Review of materials, properties, and applications
-
DOI 10.1063/1.2336999
-
N. Setter, D. Damjanovic, L. Eng, G. Fox, S. Gevorgian, S. Hong, A. Taganstev, D. V. Taylor, T. Yamada, and S. Streiffer, J. Appl. Phys. 0021-8979 100, 051606 (2006). 10.1063/1.2336999 (Pubitemid 44424530)
-
(2006)
Journal of Applied Physics
, vol.100
, Issue.5
, pp. 051606
-
-
Setter, N.1
Damjanovic, D.2
Eng, L.3
Fox, G.4
Gevorgian, S.5
Hong, S.6
Kingon, A.7
Kohlstedt, H.8
Park, N.Y.9
Stephenson, G.B.10
Stolitchnov, I.11
Taganstev, A.K.12
Taylor, D.V.13
Yamada, T.14
Streiffer, S.15
-
4
-
-
65449163069
-
-
0003-6951. 10.1063/1.3127519
-
J. G. Wu, G. Q. Kang, H. J. Liu, and J. Wang, Appl. Phys. Lett. 0003-6951 94, 172906 (2009). 10.1063/1.3127519
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 172906
-
-
Wu, J.G.1
Kang, G.Q.2
Liu, H.J.3
Wang, J.4
-
5
-
-
28044456595
-
3 thin films fabricated by chemical solution deposition
-
DOI 10.1143/JJAP.44.L561
-
H. Uchida, R. Ueno, H. Nakaki, H. Funakubo, and S. Koda, Jpn. J. Appl. Phys., Part 2 0021-4922 44, L561 (2005). 10.1143/JJAP.44.L561 (Pubitemid 43078348)
-
(2005)
Japanese Journal of Applied Physics, Part 2: Letters
, vol.44
, Issue.16-19
-
-
Uchida, H.1
Ueno, R.2
Nakaki, H.3
Funakubo, H.4
Koda, S.5
-
6
-
-
40849113431
-
-
0003-6951. 10.1063/1.2896302
-
H. Yang, H. M. Luo, H. Wang, I. O. Usov, N. A. Suvorova, M. Jain, D. M. Feldmann, P. C. Dowden, R. F. DePaula, and Q. X. Jia, Appl. Phys. Lett. 0003-6951 92, 102113 (2008). 10.1063/1.2896302
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 102113
-
-
Yang, H.1
Luo, H.M.2
Wang, H.3
Usov, I.O.4
Suvorova, N.A.5
Jain, M.6
Feldmann, D.M.7
Dowden, P.C.8
Depaula, R.F.9
Jia, Q.X.10
-
7
-
-
53349092141
-
-
0002-7820. 10.1111/j.1551-2916.2008.02536.x
-
R. Y. Zheng, C. H. Sim, J. Wang, and S. Ramakrishna, J. Am. Ceram. Soc. 0002-7820 91, 3240 (2008). 10.1111/j.1551-2916.2008.02536.x
-
(2008)
J. Am. Ceram. Soc.
, vol.91
, pp. 3240
-
-
Zheng, R.Y.1
Sim, C.H.2
Wang, J.3
Ramakrishna, S.4
-
8
-
-
34548476920
-
Thickness-dependent retention behaviors and ferroelectric properties of BiFe O3 thin films on BaPb O3 electrodes
-
DOI 10.1063/1.2775089
-
C. C. Lee and J. M. Wu, Appl. Phys. Lett. 0003-6951 91, 102906 (2007). 10.1063/1.2775089 (Pubitemid 47379052)
-
(2007)
Applied Physics Letters
, vol.91
, Issue.10
, pp. 102906
-
-
Lee, C.-C.1
Wu, J.-M.2
-
10
-
-
34547463089
-
12 double-layered thin films
-
DOI 10.1063/1.2749873
-
F. Z. Huang, X. M. Lu, W. W. Lin, W. Cai, X. M. Wu, Y. Kan, H. Sang, and J. S. Zhu, Appl. Phys. Lett. 0003-6951 90, 252903 (2007). 10.1063/1.2749873 (Pubitemid 47158110)
-
(2007)
Applied Physics Letters
, vol.90
, Issue.25
, pp. 252903
-
-
Huang, F.1
Lu, X.2
Lin, W.3
Cai, W.4
Wu, X.5
Kan, Y.6
Sang, H.7
Zhu, J.8
-
11
-
-
67650245758
-
-
0021-8979. 10.1063/1.3153955
-
J. G. Wu and J. Wang, J. Appl. Phys. 0021-8979 105, 124107 (2009). 10.1063/1.3153955
-
(2009)
J. Appl. Phys.
, vol.105
, pp. 124107
-
-
Wu, J.G.1
Wang, J.2
-
12
-
-
67650757430
-
-
0021-8979. 10.1063/1.3158556
-
N. M. Murari, R. Thomas, R. E. Melgarejo, S. P. Pavunny, and R. S. Katiyar, J. Appl. Phys. 0021-8979 106, 014103 (2009). 10.1063/1.3158556
-
(2009)
J. Appl. Phys.
, vol.106
, pp. 014103
-
-
Murari, N.M.1
Thomas, R.2
Melgarejo, R.E.3
Pavunny, S.P.4
Katiyar, R.S.5
-
13
-
-
36248930886
-
Microstructure and frequency dependent electrical properties of Mn-substituted BiFe O3 thin films
-
DOI 10.1063/1.2812594
-
S. K. Singh, H. Ishiwara, K. Sato, and K. Maruyama, J. Appl. Phys. 0021-8979 102, 094109 (2007). 10.1063/1.2812594 (Pubitemid 350129037)
-
(2007)
Journal of Applied Physics
, vol.102
, Issue.9
, pp. 094109
-
-
Singh, S.K.1
Ishiwara, H.2
Sato, K.3
Maruyama, K.4
-
14
-
-
70349330333
-
-
0021-8979. 10.1063/1.3213335
-
J. G. Wu and J. Wang, J. Appl. Phys. 0021-8979 106, 054115 (2009). 10.1063/1.3213335
-
(2009)
J. Appl. Phys.
, vol.106
, pp. 054115
-
-
Wu, J.G.1
Wang, J.2
-
15
-
-
3142655788
-
-
0003-6951. 10.1063/1.1764944
-
J. F. Li, J. L. Wang, M. Wuttig, R. Ramesh, N. Wang, B. Ruette, A. P. Pyatakov, A. K. Zvezdin, and D. Viehland, Appl. Phys. Lett. 0003-6951 84, 5261 (2004). 10.1063/1.1764944
-
(2004)
Appl. Phys. Lett.
, vol.84
, pp. 5261
-
-
Li, J.F.1
Wang, J.L.2
Wuttig, M.3
Ramesh, R.4
Wang, N.5
Ruette, B.6
Pyatakov, A.P.7
Zvezdin, A.K.8
Viehland, D.9
-
16
-
-
28344446250
-
-
0003-6951. 10.1063/1.2112181
-
Y. H. Lee, J. M. Wu, Y. L. Chueh, and L. J. Chou, Appl. Phys. Lett. 0003-6951 87, 172901 (2005). 10.1063/1.2112181
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 172901
-
-
Lee, Y.H.1
Wu, J.M.2
Chueh, Y.L.3
Chou, L.J.4
-
18
-
-
28044458539
-
-
0022-0248. 10.1016/j.jcrysgro.2005.09.036
-
Y. W. Li, J. L. Sun, J. Chen, X. J. Meng, and J. H. Chu, J. Cryst. Growth 0022-0248 285, 595 (2005). 10.1016/j.jcrysgro.2005.09.036
-
(2005)
J. Cryst. Growth
, vol.285
, pp. 595
-
-
Li, Y.W.1
Sun, J.L.2
Chen, J.3
Meng, X.J.4
Chu, J.H.5
-
19
-
-
56949103933
-
-
0169-4332. 10.1016/j.apsusc.2008.09.008
-
J. Zhu, W. B. Luo, and Y. R. Li, Appl. Surf. Sci. 0169-4332 255, 3466 (2008). 10.1016/j.apsusc.2008.09.008
-
(2008)
Appl. Surf. Sci.
, vol.255
, pp. 3466
-
-
Zhu, J.1
Luo, W.B.2
Li, Y.R.3
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